2004
DOI: 10.1049/ip-cdt:20040503
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Taking evolutionary circuit design from experimentation to implementation: some useful techniques and a silicon demonstration

Abstract: Current techniques in evolutionary synthesis of analogue and digital circuits designed at transistor level have focused on achieving the desired functional response, without paying sufficient attention to issues needed for a practical implementation of the resulting solution. No silicon fabrication of circuits with topologies designed by evolution has been done before, leaving open questions on the feasibility of the evolutionary circuit design approach, as well as on how highperformance, robust, or portable s… Show more

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Cited by 71 publications
(39 citation statements)
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“…It should be noted that designing reconfigurable logic gates are not limited to emerging transistors only, e.g., SiNW FETs, Graphene transistors, or ASL. One can get similar characteristics using only CMOS transistors, but it requires a larger number of transistors as discussed in [15][16][17]. Three-dimensional scheme of the silicon nanowire field effect transistors (SiNW FETs) with the characteristics of two separate gates, namely, the control gate (CG) and polarity gate (PG) to form either a p-channel metal-oxide-semiconductor (PMOS) or a n-channel metal-oxide-semiconductor (NMOS) field effect transistor.…”
Section: Introduction To Silicon Nanowire Fetmentioning
confidence: 99%
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“…It should be noted that designing reconfigurable logic gates are not limited to emerging transistors only, e.g., SiNW FETs, Graphene transistors, or ASL. One can get similar characteristics using only CMOS transistors, but it requires a larger number of transistors as discussed in [15][16][17]. Three-dimensional scheme of the silicon nanowire field effect transistors (SiNW FETs) with the characteristics of two separate gates, namely, the control gate (CG) and polarity gate (PG) to form either a p-channel metal-oxide-semiconductor (PMOS) or a n-channel metal-oxide-semiconductor (NMOS) field effect transistor.…”
Section: Introduction To Silicon Nanowire Fetmentioning
confidence: 99%
“…Moreover, connecting many stages of polymorphic gates in series causes another problem because, in some cases, their inputs might be connected to VDD or ground (GND). A more empirical technique is to use different VDD values, which has been already done [15]. However, employing many VDD values is not a feasible solution, especially with the new scaling technology, where the ranges of VDD are restricted.…”
Section: Designing Polymorphic Gates Using Sinw Fetsmentioning
confidence: 99%
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