2012
DOI: 10.1155/2012/710908
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Synthesis of ZnO Nanoparticles to Fabricate a Mask-Free Thin-Film Transistor by Inkjet Printing

Abstract: We report a low-cost, mask-free, reduced material wastage, deposited technology using transparent, directly printable, air-stable semiconductor slurries and dielectric solutions. We have demonstrate an emerging process for fabricating printable transistors with ZnO nanoparticles as the active channel and poly(4-vinylphenol) (PVP) matrix as the gate dielectric, respectively, and the inkjet-printed ZnO TFTs have shown to exhibit the carrier mobility of 0.69 cm2/Vs and the threshold voltage of 25.5 V. We suggest … Show more

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Cited by 16 publications
(13 citation statements)
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References 26 publications
(30 reference statements)
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“…36 However, in CBD, large amounts of material are wasted and just a small percentage is deposited as functional films. 6 The low mobility observed in the films studied here is likely limited by the presence of defects in the film due to nanocrystallites grain boundaries that could act as scattering centers. 37 Therefore, further performance improvement can be achieved by increasing the grain size to minimize grain boundaries and reduce carrier scattering.…”
Section: Resultsmentioning
confidence: 87%
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“…36 However, in CBD, large amounts of material are wasted and just a small percentage is deposited as functional films. 6 The low mobility observed in the films studied here is likely limited by the presence of defects in the film due to nanocrystallites grain boundaries that could act as scattering centers. 37 Therefore, further performance improvement can be achieved by increasing the grain size to minimize grain boundaries and reduce carrier scattering.…”
Section: Resultsmentioning
confidence: 87%
“…This annealing can also result in film cracking and peeling-off. 6 In this letter, we report an inexpensive and low material wastage additive method to grow CdS thin-films for active layer in TFTs. This is an easy and simple process that combines merits of in-situ synthesis where the reaction happens directly at the interface with the substrate (dielectric in this case).…”
mentioning
confidence: 99%
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“…Initially, majority of ZnO TFTs were primarily fabricated using vacuum based deposition techniques such as ion beam sputtering [27], RF magnetron sputtering [28,29], pulsed laser deposition [30] and atomic layer deposition [31]. However, more recently low cost solution based techniques such as spin coating [6,32], spray coating [5,33] and ink-jet printing [34,35] have also been explored to yield performance level comparable with vacuum based devices. Solution processed thin films of ZnO have been achieved either by utilizing a suspension of ZnO nanoparticles or by decomposition of Zn precursors [36].…”
Section: Introductionmentioning
confidence: 99%
“…Printed TFT devices based on inkjetted ZnO NPs have been reported in recent years. Liu et al [138] followed a low-cost, mask-free approach to fabricate bottom-gate, top-contact TFTs where both the gate dielectric and the active channel were ink-jet printed by using ZnO NP and poly(4-viylphenol) (PVP) polymer matrix-based inks, respectively. However, this device exhibited relatively poor performance, with a current on/off ratio of 4 × 10 1 , a carrier mobility of 0.69 cm 2 /Vs, and a threshold voltage of 25.5 V. Better results were achieved by Lim et al [139] who also reported on a bottom-gate n-channel ZnO TFT, where a ZnO suspension of nanorods was inkjet-printed to pattern the ZnO active channel.…”
Section: Zno-based Formulations For Inkjet Printing and Related Devicesmentioning
confidence: 99%