“…A side parameter is also the deposition time, as a conventional approach tells us that one needs to operate at low deposition rates to obtain the best coatings. Although the contribution of our group was minor in that domain, we also could deposit epitaxial films of Ag, Pd, and AgPd alloys, Cu, Rh, Pd, CuPd and CuRh alloys [7] as well as crystalline carbide and nitride films (MoC, WC, MoN, WN, CrC [8,9]). Classically, most of such coatings that provide a significant added value to the material are deposited under vacuum, as it offers an excellent control on the remaining gas impurities, it allows tuning the energy of the particles arriving on the substrate thanks to their high mean free path, and it allows complex chemistry (oxides, carbides, nitrides, alloys, …).…”