Synthesis of nanosize powders of alumina by ablation plasma produced by intense pulsed light-ion beam

Yatsui, Kiyoshi; Grigoriu, C.; Kubo, Hirotake; Masugata, Katsumi; Shimotori, Y.

doi:10.1063/1.115011

Cited by 63 publications

(13 citation statements)

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“…Pulsed laser ablation [4], vacuum vapor deposition [5], pulsed wire discharge [6] and mechanical milling [7] are physical techniques while Chemical reduction [8], Microemulsion techniques [9], sonochemical reduction [10], Electrochemical [11], Microwave assisted [12], and hydrothermal [13] are chemical approaches for the synthesis of nanoparticles. Biological or biosynthesis [14] techniques are also considered as chemical methods.…”

Section: Introductionmentioning

confidence: 99%

A green method for the synthesis of Copper Nanoparticles using L-ascorbic acid

et al. 2014

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Chemical Reduction technique was employed to prepared highly stable and dispersed Copper nanoparticles using L-Ascorbic Acid (Vitamin C) as reducing as well as capping agent. In this technique, cupric chloride was used as precursor. The effects of different molar ratios of L-Ascorbic Acid on the concentration and size of copper nanoparticles were studied. The Copper nanoparticles were characterized by X-Ray Diffraction, Atomic Absorption Spectrometry, and Fourier Transform Infrared Spectrometry. The results show that with the increase in the molar ratio of L-ascorbic acid the concentration of Copper nanoparticles were also increased. The average particles size of copper nanoparticle was found in the range of 50-60 nm. The product was kept in ambient conditions for three month but no sedimentation or separation was observed. The use of ascorbic acid makes the process a non-toxic, cost effective and environmental friendly green method.

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Section: Introductionmentioning

confidence: 99%

A green method for the synthesis of Copper Nanoparticles using L-ascorbic acid

et al. 2014

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“…In this work, morphology and oxidation of Si speices deposited by IBE in a He gas ambient is studied for the first time. Gas introduction has been developed for IBE in our previous study with ETIGO-II system (10) , utilizing two chambers (seperated by polymer films) for introducing gas and generating ion beam, respectively. This advancing overcomes the shortcoming of intense pulsed ion source, intrinsically a vacuum device that once restricted the processing in a vacuum.…”

Section: Introductionmentioning

confidence: 99%

Effects of He Ambient on Formation of Si Particles Using Pulsed Ion-Beam Evaporation

et al. 2006

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A pulsed ion-beam evaporation (IBE) technique is used to ablate Si species from bulk Si target onto quartz substrates. Large round-shaped droplets up to a few µm are predominantly formed in vacuum, whereas introduction of He gas could result in formation of particles with decreased size up to a few hundreds nm. A slight oxidation of Si particles is found even in vacuum condition, revealed by surface composition analysis using X-ray photoelectron spectroscopy (XPS). Note that the presence of He ambient obviously promotes the oxidation of as-deposited Si species. The changes in morphology and composition of formed Si particles are attributable to an enhanced interaction between ablated Si plume and the ambient gas with an increased pressure.

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“…1-3 Compared with conventional continue ion implantation, the HIPIB process possesses high power density and short pulse width to rapidly melt, evaporate, or ablate a thin surface layer of treated materials due to fast heating and cooling. This technique has been demonstrated by doping and annealing of semiconductors, 4 irradiation of metals and alloys, 5,6 ion beam mixing, 7,8 film deposition, [9][10][11] nanophase powder synthesis, 12 etc. The development of HIPIB sources has emerged as one of the most crucial issues for practical applications of HIPIB treatment.…”

Section: Introductionmentioning

confidence: 99%

Characterization of a high-intensity bipolar-mode pulsed ion source for surface modification of materials

Zhu

Lei

2002

Review of Scientific Instruments

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A high-intensity pulsed ion source of TEMP-type series, operating in bipolar mode, has been developed as a unique pulsed energy source to produce a high-intensity pulsed ion beam ͑HIPIB͒ for surface modification of materials. To generate the ion beam, a specially shaped bipolar pulse, consisting of a first negative pulse and a second delayed positive pulse both of nanosecond width, is formed by a double coaxial pulse-forming line ͑PFL͒ powered with a Marx generator and supplied to a magnetically insulated ion diode ͑MID͒ by a self-magnetic field. It is found that the efficient generation of a HIPIB is mainly dependent on the delay time of the bipolar pulse, adjusted by pressure ratio in the two gas switches of a PFL, and the anode-cathode ͑A-K͒ gap distance in the self-magnetic field MID. The delay time determines the effective area on the anode surface for plasma generation and the A-K gap distance ensures the stability of the process. A proper delay time and a proper A-K gap distance are obtained by a series of experimental investigations. Under delay time from 30 to 280 ns and several different A-K gap distances, the typical wave forms of the bipolar pulses at a dc charging voltage of 45 kV to Marx generator are illustrated to clarify the effects of delay time and A-K gap distance on the ion beam generation. The proper A-K gap distance is not uniform, varied from 6 to 8 mm, and the corresponding proper delay time is 250 ns. The most efficient plasma generation leads to a maximum output of HIPIB with a peak ion current density of 350 A cm Ϫ2 and a beam pulse width of 75 ns ͑full width at half maximum͒, at an accelerating pulse of 220 kV with a pulse width of 100 ns.

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Synthesis of nanosize powders of alumina by ablation plasma produced by intense pulsed light-ion beam

Cited by 63 publications

References 0 publications

A green method for the synthesis of Copper Nanoparticles using L-ascorbic acid

A green method for the synthesis of Copper Nanoparticles using L-ascorbic acid

Effects of He Ambient on Formation of Si Particles Using Pulsed Ion-Beam Evaporation

Characterization of a high-intensity bipolar-mode pulsed ion source for surface modification of materials

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