2010
DOI: 10.1007/s10971-010-2335-1
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Synthesis and morphology of Ba(Zr0.20Ti0.80)O3 powders obtained by sol–gel method

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Cited by 20 publications
(8 citation statements)
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“…BZT dengan berbagai komposisi Zr telah diteliti untuk mempelajari pengaruh kandungan Zr dalam lapisan tipis BaZr x Ti 1−x O 3 , dengan bertambahnya komposisi Zr maka dapat memperbesar parameter [5]. Penumbuhan lapisan tipis BaZr x Ti 1−x O 3 dapat dilakukan dengan berbagai cara diantaranya: sputtering [6], metal organic chemical vapour deposition atau MOCVD [7] dan metode sol gel [8]. Penggunaan metode-metode tersebut mempunyaii tujuan untuk mendapatkan lapisan tipis yang baik dan aplikatif.…”
Section: +unclassified
“…BZT dengan berbagai komposisi Zr telah diteliti untuk mempelajari pengaruh kandungan Zr dalam lapisan tipis BaZr x Ti 1−x O 3 , dengan bertambahnya komposisi Zr maka dapat memperbesar parameter [5]. Penumbuhan lapisan tipis BaZr x Ti 1−x O 3 dapat dilakukan dengan berbagai cara diantaranya: sputtering [6], metal organic chemical vapour deposition atau MOCVD [7] dan metode sol gel [8]. Penggunaan metode-metode tersebut mempunyaii tujuan untuk mendapatkan lapisan tipis yang baik dan aplikatif.…”
Section: +unclassified
“…BST film can be produced using fairly simple equipment on a tight budget and in relatively short time [9][10][11]. In the film-producing process, there are a number of methods that could be used such as the metalorganic chemical vapor deposition (MOCVD) method [12][13][14], the chemical vapor deposition method [15], the sol-gel method [16][17][18][19], the atomic layer deposition (ALD) method [20], the pulsed laser ablation deposition (PLAD) method [21,22], rf sputtering [17,23,24], and chemical solution deposition (CSD) method [24][25][26][27][28][29][30][31]. The CSD method is superior as it can control the film stoichiometry with good quality, an easy procedure, and has a fairly affordable cost [32][33][34].…”
Section: Introductionmentioning
confidence: 99%
“…CSD method is one of the methods to create/develop thin films [2][3][4][5][6][7][8][9][10][11][12], which has advantages including the ability to control the film stoichiometry with good quality, easy procedure, require relatively low cost, and generate a good crystalline phase [13][14][15]. In addition, thin films can also be fabricated by other methods such as metal organic chemical vapor deposition (MOCVD) [16][17][18], chemical vapor deposition [19], sol-gel [20][21][22][23], atomic layer deposition (ALD) [24], metal organic decomposition (MOD) [25], pulsed laser ablation deposition (PLAD) [26,27], and RF sputtering [2,21,28].…”
Section: Introductionmentioning
confidence: 99%