Synthesis and characterization of boron carbon nitride films by radio frequency magnetron sputtering

Characterization of Ti-B-C-N films deposited by dc magnetron sputtering of bicomponent Ti/B4C target

“…2, b is typical to that for TiN [17] and consists of two peaks centered at 397.0 eV and 398.8 eV. These peaks arise from Ti-N [18] and sp 3 C-N [20], respectively. The feature at 398.8 eV can also indicate the presence of B-N bonds [21].…”

“…And again, analysis of peaks by reference data [16] showed that this film contained the same phases as the films deposited with 25% and 40% N 2 in the gas mixture. To get information about the bonding state of deposited Ti-B-C-N films, the XPS analysis has been carried out using peak assignments from the published data [10,[17][18][19][20][21]. The XPS spectra for all the deposited Ti-B-C-N films were similar and typical Ti2p, N1s, C1s and O1s core-level spectra and their fittings are shown in Fig.…”

Elastic properties of B-C-N films grown by N2-reactive sputtering from boron carbide targets

“…One of the simplest processes is the preparation of ternary B-C-N films from B 4 C targets by N 2 -reactive sputtering, 26 in which the formation of hexagonal boron nitride was detected. Nevertheless, the composition of these B-C-N films is a matter of controversy since Freire et al 26 and Linss et al 27 concluded that B-C-N films present phase separation, while amorphous structure with atomic hybridation of B, C, and N atoms are reported by Zhou et al 28 and Jia et al 29 The aim of this work is twofold. First, to elucidate the existence of phase segregation in B-C-N films deposited on Si (100) substrates by reactive RF magnetron sputtering.…”

Compilation on Synthesis, Characterization and Properties of Silicon and Boron Carbonitride Films

“…BCN films of diverse compositions have been deposited by magnetron sputtering, mainly from h-BN and graphite targets (Ulrich et al, 1998(Ulrich et al, , 1999Zhou et al, 2000;Lei et al, 2001;Yokomichi et al, 2002;Liu et al, 2005Liu et al, , 2006 or B 4 C target (Louza et al, 2000;Martinez et al, 2001;Bengy et al, 2009;Nakao et al, 2010) or B and graphite targets Kim et al, 2004;Zhuang et al, 2009). In most cases the films were amorphous.…”

“…New signals were found (no B 4 C, no graphite, no h-BN), which confirmed the structural model in which boron nitride monolayers are in random intercalation with the graphite ones. BCN films were deposited by RF magnetron sputtering from h-BN and graphite targets in an Ar-N 2 gas mixture (Zhou et al 2000). A large variety of analytical methods was used: XPS, Auger, FTIR, Raman, XRD, and nanoindentation.…”