Synthèse de polystyrènes chlorométhylés renfermant des radicaux tétrathiafulvalénylphénoxyméthyles

Abstract

In order to study the influence of the nature of the moiety bearing a tetrathiafulvalenyl group in the polymers upon the microlithographic properties of resists, poly@-chloromethy1styrene)s and poly(styrene-co-p-chloromethy1styrene)s containing the 4-tetrathiafulvalenylphenoxymethyl group with a variety of controlled molecular weights and molecular weight distributions were studied. The copolymers were all prepared by reaction of poly(4-vinylbenzyl chloride) with potassium 4-tetrathiafulvalenylphenolate (3). Without exception, the resulting polylp-chloromethylstyrene-co-p-(tetrathiafulvalenylphenoxymethyl)styrene]s are highly insoluble. However, by reaction of potassium 4-tetrathiafulvalenylphenolate with poly(styrene-co-p-chloromethylstyrene) soluble copolymers could be prepared.