2016
DOI: 10.1007/s13391-016-5369-x
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Switching characteristics of TaO x -based one diode-one resistor for crossbar memory application

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Cited by 4 publications
(4 citation statements)
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“…[125][126][127][128] Oxide-based diodes have no CMOS compatibility issue. They can also be fabricated with relatively low-temperature processes; [114,123,124,[129][130][131][132][133] for example, Yoon et al reported a 1D1R crossbar array shown in Figure 5a using physical vapor deposition methods at low temperature. [134] The top-view and cross-sectional scanning electron microscopy (SEM) images are shown in Figure 5b, showing the device structure consisting of Ti/TiO 2 /Pt/SiO x /Pt.…”
Section: D1r Cell and Crossbar Arraymentioning
confidence: 99%
“…[125][126][127][128] Oxide-based diodes have no CMOS compatibility issue. They can also be fabricated with relatively low-temperature processes; [114,123,124,[129][130][131][132][133] for example, Yoon et al reported a 1D1R crossbar array shown in Figure 5a using physical vapor deposition methods at low temperature. [134] The top-view and cross-sectional scanning electron microscopy (SEM) images are shown in Figure 5b, showing the device structure consisting of Ti/TiO 2 /Pt/SiO x /Pt.…”
Section: D1r Cell and Crossbar Arraymentioning
confidence: 99%
“…The sneaking current path is a fundamental problem commonly existing in 2D or 3D cross-bar array, [25][26][27][28][29][30] as shown in Fig. 1.…”
Section: Sneaking Current Problemmentioning
confidence: 99%
“…[4] In addition, this leakage becomes severe when all adjacent cells have low resistance values and the crossbar array is scaled up. Various approaches have been conducted to alleviate these interferences through transistors, [5,6] unidirectional diodes, [7][8][9] and bidirectional diodes. [10][11][12][13] However, transistors are active components based on a three-electrode structure, occupying a large footprint of 6F 2 and requiring complicated steps to be downscale to 4F 2 .…”
Section: Introductionmentioning
confidence: 99%