2008
DOI: 10.1016/j.spmi.2008.06.006
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Surface topology of GaSe oxidized crystals

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Cited by 15 publications
(9 citation statements)
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“…Surface defects that are formed upon breaking chemical bonds between the atoms in GaSe as a result of this action contain metallic Ga. The oxidation of the imperfect GaSe VDW surfaces results in the formation of Ga 2 O 3 nanostructures [10,11]. The AFM topographic image (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Surface defects that are formed upon breaking chemical bonds between the atoms in GaSe as a result of this action contain metallic Ga. The oxidation of the imperfect GaSe VDW surfaces results in the formation of Ga 2 O 3 nanostructures [10,11]. The AFM topographic image (Fig.…”
Section: Resultsmentioning
confidence: 99%
“…In bulk form, GaSe is generally considered as a stable material and is known to have a high laser damage threshold suitable for non-linear optics applications 20,21 . Nonetheless, bulk GaSe is also known to naturally form a native oxide 22 and thermally-and photo-induced oxidation has been reported [23][24][25] . Recently, exposure to intense laser light was found to degrade optical properties and lead to chemical transformations [26][27][28] .…”
mentioning
confidence: 99%
“…The roughness of continuous β Ga 2 O 3 layers grown on the GaSe (0001) surface using such a tech nique did not exceed ~0.2 nm. We note that the surface roughness of β Ga 2 O 3 layers grown on n GaAs by electrochemical oxidation [22] or thermal oxidation of the GaSe(0001) surface in air at T a > 300°C [7] was several nm. The β Ga 2 O 3 compound is a defect n type semiconductor that has a monoclinic structure with the lattice parameters a = 12.23 Å, b = 3.04 Å, c = 5.8 Å, β = 103.7°.…”
Section: Surface Morphology Of Hybrid Nanostructuresmentioning
confidence: 84%
“…However, the surface chemical reactions that occur when GaSe is in contact with ferromagnetic metals (Fe [5], Ni [6]) limit the pos sibility of efficient spin injection in (ferromagnetic metal)/(semiconductor surface) hybrid structures fab ricated on the basis of this crystal. On a GaSe (0001) surface, thin (nanoscale) layers of Ga 2 O 3 thermal oxide [7] and natural oxide which is a mixture of Ga 2 O 3 and wide gap Ga and Se oxides can be grown [8,9]. On oxidized GaSe surfaces, In/GaO x /p GaSe [8] and ITO/Ga 2 O 3 /p GaSe [10] MOS structures have been formed.…”
Section: Introductionmentioning
confidence: 99%