1998
DOI: 10.1063/1.368204
|View full text |Cite
|
Sign up to set email alerts
|

Surface roughness and in-plane texturing in sputtered thin films

Abstract: Real surfaces are not flat on an atomic scale. Studying the effects of roughness on microstructural evolution is of relevance because films are sputtered onto nonideal surfaces in many applications. To this end, amorphous rough substrates of two different morphologies, either elongated mounds or facets, were fabricated. The microstructural development of films deposited onto these surfaces was examined. In particular, the development of a preferred crystallographic orientation in the plane of growth in 400 nm … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
13
0

Year Published

1999
1999
2023
2023

Publication Types

Select...
7
2

Relationship

1
8

Authors

Journals

citations
Cited by 29 publications
(13 citation statements)
references
References 14 publications
0
13
0
Order By: Relevance
“…Reason for this preference of growth in Cr is unclear, though, there were studies on Mo thin films that in-plane texture could happen due to self shadowing, anisotropic grain growth etc. for thicker films [12]. In the present case, we see a preference within the plane at much lower film thicknesses.…”
Section: B Cr Underlayer Growth On Textured Substratesmentioning
confidence: 78%
“…Reason for this preference of growth in Cr is unclear, though, there were studies on Mo thin films that in-plane texture could happen due to self shadowing, anisotropic grain growth etc. for thicker films [12]. In the present case, we see a preference within the plane at much lower film thicknesses.…”
Section: B Cr Underlayer Growth On Textured Substratesmentioning
confidence: 78%
“…The simplest version of OAD on a template uses a rough substrate surface; the elongated mounds or facets promoting the accumulation of deposited material onto the most prominent features, while at the same time preventing the arrival of vapor flux at the shadowed regions [97]. Expanding on this simple approach, the use of substrates with a well-defined lithographic pattern opens up a range of new and unexpected possibilities for the nano-structuring of OAD thin films.…”
Section: Oad On Nanostructured Substratesmentioning
confidence: 99%
“…The creation of such mirco-relief is investigated for decades (e.g., [4][5][6]) and in recent studies nanostructuring was emphasised (e.g., [16]). Also several theoretical approaches describe this micro-roughening [17,18].…”
Section: Figs 1 and 2 Show Typical Erosion Morphologies For H þmentioning
confidence: 99%