2010
DOI: 10.1063/1.3463458
|View full text |Cite|
|
Sign up to set email alerts
|

Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films

Abstract: We report an investigation on magnetic anisotropy of Co/Si͑111͒ films deposited at oblique incidence. An in-plane uniaxial magnetic anisotropy ͑UMA͒ with the easy axis perpendicular to the incident flux plane was observed to superimpose on sixfold magnetocrystalline anisotropy of Co films. We built a total energy model to investigate the magnetization reversal mechanism around hard axis. The simulated value of UMA is K u = 1.7ϫ 10 5 erg/ cm 3 , which is consistent with K shape = 1.1ϫ 10 5 erg/ cm 3 calculated … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

1
23
0

Year Published

2013
2013
2022
2022

Publication Types

Select...
7

Relationship

2
5

Authors

Journals

citations
Cited by 22 publications
(24 citation statements)
references
References 15 publications
1
23
0
Order By: Relevance
“…This indicates negligible out-of-plane magnetic anisotropy in the thick FeGa films. As shown in figure 2(b), it is observed that the UMA (K u =H u M s /2) exhibits a general increasing trend with oblique angle, which coincides with the fact the shadowing effect is stronger at larger angles of incidence [16][17][18][19]. Interestingly the oblique deposition also affects the cubic anisotropy K 4 (K 4 =H 4 M s /2).…”
Section: Resultssupporting
confidence: 62%
See 3 more Smart Citations
“…This indicates negligible out-of-plane magnetic anisotropy in the thick FeGa films. As shown in figure 2(b), it is observed that the UMA (K u =H u M s /2) exhibits a general increasing trend with oblique angle, which coincides with the fact the shadowing effect is stronger at larger angles of incidence [16][17][18][19]. Interestingly the oblique deposition also affects the cubic anisotropy K 4 (K 4 =H 4 M s /2).…”
Section: Resultssupporting
confidence: 62%
“…The obtained maxima of twofold TMS exhibits an increasing trend with the oblique angle (shown in figure 4(c)). According to previous works on the shadowing effect [16][17][18][19], the larger deposition angle makes the shadowing effect stronger, and the dipolar fields within stripelike defects increase just like the UMA. This can clearly explain that the intensity of twofold TMS follows exactly the same trend with the deposition angle as the UMA.…”
Section: Resultsmentioning
confidence: 86%
See 2 more Smart Citations
“…The obstacle resulted from the interdiffusion between the magnetic metals and Si substrates can be overcome via inserting a buffer layer of copper or iron silicides1718. In our previous work19202122, quasi 1D magnetic nanodot assemblies were fabricated on vicinal Si(111) surface with relatively large miscut angles (~4°). Unfortunately, the terrace width of these stepped substrates cannot be tuned easily once the miscut angle is fixed, which causes difficulty in investigating the effect of terrace width on magnetic properties by using identical substrates.…”
mentioning
confidence: 99%