Supercritical Fluids for the Fabrication of Semiconductor Devices: Emerging or Missed Opportunities?

A comparative study of copper thin films deposited using magnetron sputtering and supercritical fluid deposition techniques

“…Supercritical fluid chemical deposition (SFCD) process mainly developed with supercritical carbon dioxide (scCO2) can also be an alternative method that enables the fabrication of nanostructured films in an environmentally friendly manner and from a scalable technology [10][11][12][13][14]. SCFD technique is a one-pot, multi-step process that involves, the dissolution of a metallic precursor in a supercritical fluid followed by a chemical reaction (i.e.…”

“…Compared to gas or liquid phase processes, SCFD is a hybrid approach that combines advantages of CVD and liquid-phase deposition with a greater precursor concentration and an environmentally friendly process. Using scCO2 (Tc = 31 °C, Pc = 73.8 × 10 6 Pa) [11], no liquid waste is generated and no solvent residue is left on the substrate. Supercritical CO2 presents the ability to solubilize a wide range of metallic precursors (Acetylacetonate, 2,2,6,6-tetramethylheptane-3,5-dione, hexafluoroacetylacetone, 2,2,7-trimethyl-3,5-octanedionate, diisobutyrylmethane, cyclopentadienyl, etc…) and enables the deposition at high precursor concentration necessary for growth of films.…”

The effects of supercritical CO2 formulations on the removal of high-dose ion-implanted photoresists

“…4, the stripping efficiency was found to be dependent on the temperature at the constant pressure (10)(11)(12)(13)(14)(15)(16)(17)(18)(19)(20)(21)(22)(23)(24)(25). The stripping rate increased with the elevated temperature below 60°C, while the reverse results were obtained at 70°C and 80°C.…”

“…Recently, supercritical CO 2 (scCO 2 ) has been proposed as a promising cleaning medium for photoresist stripping [8][9][10]. The properties of near zero surface tension and tunable solvating ability in conjunction with its advantages of moderate critical temperature and pressure, nonflammability, ease of availability, low cost, and being environmentally benign render scCO 2 an attractive solvent in a variety of applications in microelectronic manufacturing [11][12][13].…”

Deposition of Ni nanoparticles onto porous supports using supercritical CO 2 : effect of the precursor and reduction methodology

“…In most experiments, nickel bis(cyclopentadienyl) [Ni(Cp) 2 ] has been chemically reduced using H 2 in scCO 2 . This precursor exhibits a high solubility in scCO 2 [28,29] but it is air and light sensitive. Blackburn et al [1] produced continuous Ni films on planar and patterned silicon wafers.…”