A comparative study of copper thin films deposited using magnetron sputtering and supercritical fluid deposition techniques

Abstract

:A comparison of crystallinity, microstructure, surface morphology and electrical conductivity is proposed for the deposition of copper films, using supercritical fluid chemical deposition (SFCD) and RF magnetron sputtering techniques. Both preparation methods yield nanocrystalline Cu films (< 100 nm) but SFCD gives access to a higher crystallinity for the same AlN substrate temperature during the deposit. Based on the film characteristics, a comparison of the evolution of electrical properties is done for RF magnetron sputtered copper films and SFCD ones with H2 as reducing agent. Uniform strain values are significantly reduced when SFCD technique is used and crystallinity is highly increased leading to lower resistivity values for a same crystallite size. This study demonstrates the viability of the SFCD technique to produce high quality nanostructured copper thin films with low resistivity values.

A comparative study of the influence of the deposition technique (electrodeposition versus sputtering) on the properties of nanostructured Fe70Pd30 films

“…For a given material composition, comparative studies on the morphological and structural characteristics of films derived from physical and (electro) chemical deposition methods are rather scarce in literature [17][18][19]. Although the pros and cons of the different deposition methods are well known by the scientific community, specific considerations may apply to the particular system under investigation, and such features cannot be straightforwardly generalized.…”

Chemistry in supercritical fluids for the synthesis of metal nanomaterials

“…The versatility of using supercritical CO2 in the development of metal nanomaterials has been shown in various forms, including (1) the synthesis and CO2-assisted synthesis of monodispersed metal NPs, in both the bottomup 51,[87][88][89]91,[98][99][100][101]107,118 and top-down 119,120 ways, (2) micelles dispersed in supercritical CO2 as 'nano-reactors' for the growth of metal NPs, [168][169][170][171][172][173][174][175][176][177][178] (3) template growth of robust metal nanostructures (nanofilms, 60,62,[179][180][181][182][183][184][185][186][187][188][189][190][191] nanowires, nanotubes [192][193][194][195] and porous nanostructures [196][197][198], and (4) deposition and immobilization o...…”

Influence of Pretreatment on Adhesion Quality of Supercritical-fluid-deposited Cu Film on Si

“…(22) SCFD film quality also depends on other deposition conditions such as precursor material and its amount, as well as supercritical CO 2 (scCO 2 ) and H 2 concentrations; (22,23) they are set to be constant in this paper. Comparisons between SCFD and other deposition techniques were well investigated by Teraoka et al (18) and Giroire et al, (24) which are excluded in this paper.…”