Summary Abstract: Properties of ion plated oxide films

Formation of Optical Thin Films by Ion and Plasma Assisted Techniques

“…Later on, special plasma sources were developed which made higher ion densities and therefore lower acceleration voltages (≤ 100 V) possible. The most important examples for those "advanced ion plating" methods are reactive low voltage ion plating (RLVIP) [19,20] and the so-called plasma ion assisted deposition (PIAD) [21,22]. RLVIP uses a low-voltage high-current electron beam (thermionic arc) directed to the crucible of the electron beam evaporator.…”

Effects of an Electroplated Platinum Interlayer on the Morphology and Phases of Chemically‐Vapor‐Deposited Alumina on Single‐Crystal, Nickel‐Based Superalloy

“…The CVD process is the only technique currently capable of commercially producing ␣-Al 2 O 3 in the form of coherent and dense coatings in the cutting tool industry. PVD methods such as sputtering, 9 reactive sputtering, 10,11 reactive evaporation, 12 ion-assisted deposition, 13,14 and cathodic arc plasma deposition 15 are generally known to produce metastable or amorphous Al 2 O 3 , unless postdeposition annealing above 1000°C is applied.…”