Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy

Abstract

By the powerful combination of in situ FTIR and in vacuo XPS, the surface species during ALD of TDMAT with different reactants could be identified.

An IR Spectroscopy Study of the Degradation of Surface Bound Azido-Groups in High Vacuum

“…In addition, the technique provides chemical information without the need of a high vacuum chamber to perform the measurement or the use of an irradiation source that might cause photo-oxidation of the azido-groups such as an UV- or X-ray irradiation. Furthermore, the degradation during the high vacuum treatment can be studied using in situ FTIR, which has previously been demonstrated to be a very sensitive technique to measure changes of chemical bonds at the surface …”

“…Furthermore, the degradation during the high vacuum treatment can be studied using in situ FTIR, which has previously been demonstrated to be a very sensitive technique to measure changes of chemical bonds at the surface. 48 Silicon samples coated with 70 nm TiN and a 3 nm thin film of SiO 2 are used as the substrate for the N 3 −SAM deposition, to facilitate in situ reflection FTIR experiments. The TiN layer is deposited by reactive sputtering using nitrogen gas and a Ti target (Endura, Applied Materials Inc.).…”

Enhancing the Properties of Photocatalysts via Nonthermal Plasma Modification: Recent Advances, Treatment Variables, Mechanisms, and Perspectives

“…However, only with the help of in vacuo XPS can surface composition be accurately identified and quantified. Based on this, the mechanism of TiO 2 obtained from tetrakis­(dimethylamino)­titanium (TDMAT) in H 2 O vapor, H 2 O–plasma, or O 2 –plasma was investigated by combining in situ FTIR and in vacuo XPS by Vandenbroucke et al …”

“…Based on this, the mechanism of TiO 2 obtained from tetrakis(dimethylamino)titanium (TDMAT) in H 2 O vapor, H 2 O−plasma, or O 2 −plasma was investigated by combining in situ FTIR and in vacuo XPS by Vandenbroucke et al. 102 In situ FTIR was applied to detect the generation of surface species, such as imine and isocyanate during the deposition, while in vacuo XPS was used to identify surface groups (CO and NOx). These spectroscopic analyses were essential to provide quantitative information on the chemical composition, which enables researchers to analyze the plasmaenhanced ALD reaction mechanisms.…”

In situ ellipsometry monitoring of TiO2 atomic layer deposition from Tetrakis(dimethylamido)titanium(IV) and H2O precursors on Si and InSkopin1, Abdukayumov2, Younes3 et al. 2021Thin Solid Films7010View full textAdd to dashboardCite

“…Ti[(CH 3 ) 2 N] 4 or Tetrakis(dimethylamido)titanium(IV) (hereinafter TDMAT) and water. Despite the significant number of publication reporting on TiO 2 ALD from TDMAT and water [12,13,14,15,16,17,18,19,20,21,22,23,24,25,26,27,28,29,30,31,32,31,33], there is no clear idea of all the possible chemical reactions on the surface during the growth process and also there is no unique behavior of growth curves (Growth Per Cycle) as a function of the growth temperature. Additionally, it was shown that the TiO 2 initial growth stages depend on substrate chemistry, as in the case of ZnO ALD [34,35,36,37], TiO 2 exhibit different types of growth depending on the surface [15,29].…”