In situ ellipsometry monitoring of TiO<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" altimg="si1.svg"><mml:msub><mml:mrow/><mml:mn>2</mml:mn></mml:msub></mml:math> atomic layer deposition from Tetrakis(dimethylamido)titanium(IV) and H<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" altimg="si1.svg"><mml:msub><mml:mrow/><mml:mn>2</mml:mn></mml:msub></mml:math>O precursors on Si and In<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" altimg="si4.svg"><mml:msub><mml:mrow/><mml:mrow><m

Skopin, E. V.; Abdukayumov, Khasan; Younes, Petros Abi; Anikin, Mikhail; Roussel, Hervé; Deschanvres, Jean‐Luc; Renevier, H.

doi:10.1016/j.tsf.2021.138591

Cited by 7 publications

(1 citation statement)

References 47 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…On the other hand, ratio of refraction index and dielectric constant average values determined for both samples are practically independent of wavelength interval, being <n> Ox+SiO2/APTES /<n> Ox+SiO2/APTES/O 3 ~ 0.9 and <ε r > Ox+SiO2/APTES /<ε r > Ox+SiO2/APTES/O 3 ~ 0.8, proving evidence of surface effect difference associated to samples modification. Furthermore, the possibility of performing in - situ SE measurements during ALD deposition in both, custom-made and commercial devices, provides not only an accurate monitoring of the deposited film thickness and growth mechanisms, but also a powerful tool to determine film optical properties, including the possibility to tune at will some physical parameters of the samples such as the refraction index [ 64 , 65 , 66 ].…”

Section: Resultsmentioning

confidence: 99%

Surface Modification of Nanoporous Anodic Alumina during Self-Catalytic Atomic Layer Deposition of Silicon Dioxide from (3-Aminopropyl)Triethoxysilane

et al. 2021

View full text Add to dashboard Cite

Changes associated to atomic layer deposition (ALD) of SiO2 from 3-aminopropyl triethoxysilane (APTES) and O3, on a nanoporous alumina structure, obtained by two-step electrochemical anodization in oxalic acid electrolyte (Ox sample) are analysed. A reduction of 16% in pore size for the Ox sample, used as support, was determined by SEM analysis after its coverage by a SiO2 layer (Ox+SiO2 sample), independently of APTES or O3 modification (Ox+SiO2/APTES and Ox+SiO2/APTES/O3 samples). Chemical surface modification was determined by X-ray photoelectron spectroscopy (XPS) technique during the different stages of the ALD process, and differences induced at the surface level on the Ox nanoporous alumina substrate seem to affect interfacial effects of both samples when they are in contact with an electrolyte solution according to electrochemical impedance spectroscopy (EIS) measurements, or their refraction index as determined by spectroscopic ellipsometry (SE) technique. However, no substantial differences in properties related to the nanoporous structure of anodic alumina (photoluminescent (PL) character or geometrical parameters) were observed between Ox+SiO2/APTES and Ox+SiO2/APTES/O3 samples.

show abstract

Section: Resultsmentioning

confidence: 99%