“…[21][22][23] However, the effect of a-Al 2 O 3 substrates' nitridation on the properties of GaN lms during PLD growth, as well as the growth mechanism of GaN on nitrided a-Al 2 O 3 substrates by PLD, lacks thorough study. [24][25][26][27] In this work, we investigate on the effect of a-Al 2 O 3 substrates nitridation on the properties of GaN lms grown by PLD systematically and propose the growth mechanism of GaN lms on nitrided a-Al 2 O 3 substrates by PLD. An effective approach to achieve high-quality GaN lms on a-Al 2 O 3 substrates by PLD is hence presented.…”
High-quality GaN films with sharp and abrupt interfaces have been achieved on nitrided α-Al2O3 substrates by pulsed laser deposition. The effect of nitridation on the properties and the growth mechanism of GaN films have been carefully studied.
“…[21][22][23] However, the effect of a-Al 2 O 3 substrates' nitridation on the properties of GaN lms during PLD growth, as well as the growth mechanism of GaN on nitrided a-Al 2 O 3 substrates by PLD, lacks thorough study. [24][25][26][27] In this work, we investigate on the effect of a-Al 2 O 3 substrates nitridation on the properties of GaN lms grown by PLD systematically and propose the growth mechanism of GaN lms on nitrided a-Al 2 O 3 substrates by PLD. An effective approach to achieve high-quality GaN lms on a-Al 2 O 3 substrates by PLD is hence presented.…”
High-quality GaN films with sharp and abrupt interfaces have been achieved on nitrided α-Al2O3 substrates by pulsed laser deposition. The effect of nitridation on the properties and the growth mechanism of GaN films have been carefully studied.
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