In this work, n-type porous silicon (n-PS) was fabricated via photoelectrochemical etching (PECE) method with different etching current densities, including 5, 10, 15, 20, and 25 mA/cm 2 at constant concentration of HF about 20%. The suspension mixture of standard copper oxide nanoparticles (CuO-NPs) was prepared by dissolving 0.2 g of CuO powder in 100-ml ethanol. Then, CuO-NPs were deposited on n-PS surface employing the drop-casting method. X-ray diffraction and scanning electron microscope techniques proved the cubic crystal phase with porous morphology. The current-voltage (J-V) measurements were conducted in the dark and under illumination with different intensities for n-PS and CuO/PS samples. To evaluate the photodetector-sensing performance, the responsivity (R λ ), detectivity (D), and the quantum efficiency (Q.E) tests were performed for all samples at room temperature. All results showed that the CuO-NPs on the n-PS surface lead to increase R λ , D, and Q.E compared with n-PS-only sample.