2003
DOI: 10.1016/s0022-0248(03)01092-3
|View full text |Cite
|
Sign up to set email alerts
|

Studies on inclined nuclei as a cause of crystallinity deterioration in epitaxial CeO2(110) layers on Si(100) substrates

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

1
33
0

Year Published

2006
2006
2009
2009

Publication Types

Select...
5

Relationship

1
4

Authors

Journals

citations
Cited by 13 publications
(34 citation statements)
references
References 19 publications
1
33
0
Order By: Relevance
“…MS has been used to grow a variety of epitaxial oxides of interest as optical waveguides, [217] light emitters, [218][219][220][221] capacitor dielectrics, [222,223] high-T c superconductors, [224][225][226][227][228] photocatalysts, [229] gas sensors, [83] ferroelectrics, [230][231][232][233] piezoelectrics, [46,234] conductive oxides, [235][236][237][238][239] gate dielectrics, [29,[240][241][242][243][244] magnetoresistive materials, [245][246][247][248][249][250][251][252][253][254][255][256][257] general purpose insulators, [258,259] magnetic insulators, [260,261...…”
Section: Magnetron Sputteringmentioning
confidence: 99%
“…MS has been used to grow a variety of epitaxial oxides of interest as optical waveguides, [217] light emitters, [218][219][220][221] capacitor dielectrics, [222,223] high-T c superconductors, [224][225][226][227][228] photocatalysts, [229] gas sensors, [83] ferroelectrics, [230][231][232][233] piezoelectrics, [46,234] conductive oxides, [235][236][237][238][239] gate dielectrics, [29,[240][241][242][243][244] magnetoresistive materials, [245][246][247][248][249][250][251][252][253][254][255][256][257] general purpose insulators, [258,259] magnetic insulators, [260,261...…”
Section: Magnetron Sputteringmentioning
confidence: 99%
“…In the literature, textured CeO 2 layers have been made using different growth methods like pulsed laser deposition, [16,17] ion beam assisted deposition, [18] rf sputtering, [19] dc sputtering, [20] ebeam evaporation, [21] metal organic chemical vapor deposition, [22] plasma enhanced chemical vapor deposition, [23] spray pyrolysis, [24] and molecular beam epitaxy. [25] In these papers, the thin films were characterized using various techniques such as X-ray diffraction (XRD), [16 -22,24] atomic force microscopy, [16] X-ray photoelectron spectroscopy, [17,24] transmission electron microscopy, [19,23] Rutherford backscattering spectroscopy, [19] reflection high energy electron, [20] glancing incidence XRD, [23] electron probe microanalysis, [24] scanning electron microscopy.…”
Section: Introductionmentioning
confidence: 99%
“…[25] In these papers, the thin films were characterized using various techniques such as X-ray diffraction (XRD), [16 -22,24] atomic force microscopy, [16] X-ray photoelectron spectroscopy, [17,24] transmission electron microscopy, [19,23] Rutherford backscattering spectroscopy, [19] reflection high energy electron, [20] glancing incidence XRD, [23] electron probe microanalysis, [24] scanning electron microscopy. [24] All these investigation methods made it possible to study the effects of growth methods, deposition parameters, and post-growth annealing on the quality of CeO 2 layers.…”
Section: Introductionmentioning
confidence: 99%
“…Over that thickness, the composition and possibly the structure of the oxide varies towards an increasingly Ce-rich sub-oxide in the vicinity of the metal alloy surface. Epitaxial CeO 2 layers have been successfully grown on a wide range of substrates that include Al 2 O 3 , MgO, Si and high T c compounds [4][5][6][7]. To the best of our knowledge the present observation is the first report of such epitaxial layers grown on the parent metal.…”
Section: Epitaxial Surface Oxide Layersmentioning
confidence: 91%