2012
DOI: 10.1088/0022-3727/45/15/154010
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Structured epitaxial graphene: growth and properties

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Cited by 43 publications
(60 citation statements)
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“…Note that another group has recently reported a monolayer graphene island of two hundred square micrometers on non-uniform SiC steps. 24 Growth of large islands originates from a nucleation energy being large than the propagation energy. 17 We have carried out growth for different periods of time and found that the shorter the annealing time, the lower the island density is and the smaller the islands are.…”
Section: Resultsmentioning
confidence: 99%
“…Note that another group has recently reported a monolayer graphene island of two hundred square micrometers on non-uniform SiC steps. 24 Growth of large islands originates from a nucleation energy being large than the propagation energy. 17 We have carried out growth for different periods of time and found that the shorter the annealing time, the lower the island density is and the smaller the islands are.…”
Section: Resultsmentioning
confidence: 99%
“…The SiC substrate Raman spectrum was subtracted. Note that the graphene 2D peak has a single Lorentzian shape as typical for MEG [9] . The extremely small D peak reveals the high structural quality of MEG that is not affected by the annealing in air.…”
Section: Methodsmentioning
confidence: 97%
“…Most strategies involve the transfer of graphene sheets onto silicon, with the inherent difficulties of clean transfer [3][4][5] and subsequent graphene nano-patterning that degrades considerably the electronic mobility of nanopatterned graphene [6,7] . Epitaxial graphene (EG) by contrast is grown on an essentially perfect crystalline (semi-insulating)surface, and graphene nanostructures with exceptional properties [8][9][10][11] have been realized by a selective growth process on tailored SiC surface that requires no graphene patterning [9,12,13] .However, the temperatures required in this structured growth process are too high for silicontechnology. Here we demonstrate a new graphene to Si integration strategy, with a bonded and interconnected compact double-wafer structure.…”
mentioning
confidence: 99%
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