An analysis of the morphology of the extended defects revealed behind dislocation in the slip plane of silicon is presented. These extended defects show an electrical activity contradictorily to dislocations themselves; this is confirmed by Electron Induced Surface Potential (EISP) measurements. It is shown, that the generation of these extended defects is a common phenomenon for diamond lattice materials. The defects generation which has to be elucidated is considered to be relevant to a dynamical dislocation core structure during the plastic deformation of semiconductor materials with covalent lattice. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)