Structure and Characteristics of C3n4 Thin Films

Abstract

Nitride carbon thin films have been deposited by plasma-enhanced chemical vapor phase deposition. The results of transmission-electron diffraction indicated that films have polycrystal structures. Carbon and nitrogen atoms binding energies and the nitrogen content of the-films are measured out by X-ray photoelectron spectroscopy.The Fourier transform infrared spectrum show that there is no graphite phase in the films,and the Vickers hardness of the films vary from 29.2 to 50.0GPa.