2003
DOI: 10.1016/s0038-1098(02)00673-7
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Electrical conductivity of nitride carbon films with different nitrogen content

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Cited by 48 publications
(32 citation statements)
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“…The Pt layer (150 nm) deposited by RF sputtering below the DLC (n-type) layer is deliberately chosen to increase the adhesiveness of DLC (n-type) on ITO and also to retain the good conductivity required between DLC (n-type) and ITO. Since a specific doping amount of nitrogen in DLC gives the highest conductivity [20], the concentration of nitrogen is monitored by depositing the DLC (n-type) layer for 1.5 min each with 0, 5, 10, 30 and 60 sccm of N 2 resulting in thicknesses of 165, 165, 198, 199, 165.5 nm, respectively. Hopping conduction is enhanced through N incorporation and the corresponding lattice relaxation.…”
Section: Resultsmentioning
confidence: 99%
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“…The Pt layer (150 nm) deposited by RF sputtering below the DLC (n-type) layer is deliberately chosen to increase the adhesiveness of DLC (n-type) on ITO and also to retain the good conductivity required between DLC (n-type) and ITO. Since a specific doping amount of nitrogen in DLC gives the highest conductivity [20], the concentration of nitrogen is monitored by depositing the DLC (n-type) layer for 1.5 min each with 0, 5, 10, 30 and 60 sccm of N 2 resulting in thicknesses of 165, 165, 198, 199, 165.5 nm, respectively. Hopping conduction is enhanced through N incorporation and the corresponding lattice relaxation.…”
Section: Resultsmentioning
confidence: 99%
“…and their band gap can be tuned by manipulating the sp 2 and sp 3 bonding ratio [17,18]. The electrical conductivity of DLC films can be improved by doping with nitrogen [19] to result in semi-conducting to highly conducting behavior [20,21]. DLC films are in use as antireflection and protective coatings of solar cells designed for space [22] while the nitrogen doped DLC films are used in similar p-n junction solar cells or schottky solar cells in combination with p-Si or ITO, respectively [23,24].…”
Section: Introductionmentioning
confidence: 99%
“…Their properties are strongly dependent on the deposition techniques employed in their fabrication [1][2]. Most a-CN x films prepared by chemical vapor deposition (CVD) have a nitrogen concentration of less than 0.3, and exhibit high hardness, optical transparency, and high resistivity [3][4][5][6][7]. In contrast, a-CN x films prepared by physical vapor deposition (PVD) have a higher nitrogen concentration [8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…Benefiting from its hardness, chemical inertness, low friction coefficient, high refractive index, high thermal and electrical conductivity [1][2][3], they have widespread applications as protective coatings for optical windows, automobile parts, biomedical coatings, computer hard disks and micro-electrochemical devices (MEMs), but also for the coating of filler particles and antistatic treatments [1,4,5]. The attraction of a conjugated conductive, rather homogeneous carbon films lies in the essential absence of grain boundary effects and minimization of contact resistance.…”
Section: Introductionmentioning
confidence: 99%