Chinese Phys.
 2000
DOI: 10.1088/1009-1963/9/7/015
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Crystalline carbon nitride thin films deposited by microwave plasma chemical vapor deposition

Yongping Zhang
1
,
Yousong Gu
2
,
Chang Xiangrong
3
et al.

Abstract: ping(¥) a)b) , Gu You-song(£AE¨) a) , Chang Xiang-rong(«¦) a) , Tian Zhong-zhuo(©) a) , Shi Dong-xia(§¡ª) b) , Zhang Xiu-fang(¬¢) b) , and Yuan Lei(¯¤) b)

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