Structural and Physical Characteristics of Ultrananocrystalline Diamond/Hydrogenated Amorphous Carbon Composite Films Deposited Using a Coaxial Arc Plasma Gun

Abstract

Ultrananocrystalline diamond (UNCD)/hydrogenated amorphous carbon (a-C:H) films were formed without initial nucleation using a coaxial arc plasma gun. The UNCD crystallite diameters estimated from the X-ray diffraction peaks were approximately 2 nm. The Fourier transform infrared absorption spectrum exhibited an intense sp 3 -CH peak that might originate from the grain boundaries between UNCD crystallites whose dangling bonds are terminated with hydrogen atoms. A narrow sp 3 peak in the photoemission spectrum implied that the film comprises a large number of UNCD crystallites. Large optical absorption coefficients at photon energies larger than 3 eV that might be due to the grain boundaries are specific to the UNCD/a-C:H films.

Near-Edge X-ray Absorption Fine-Structure Study on Hydrogenated Boron-Doped Ultrananocrystalline Diamond/Amorphous Carbon Composite Films Prepared by Coaxial Arc Plasma Deposition

“…The 26.7-Pa film should contain CH bonds GBs and an a-C:H matrix in the films. 7 The detailed analysis is under investigation, considering additional results obtained by other spectroscopic methods.…”

“…4 , 5 UNCD/a-C:H films possess the following features: a) large optical absorption coefficients of more than 10 5 cm 1 in the photon energy range from 3 to 6 eV, 6,7 and b) p and n-type conductions are possible by doping nitrogen and boron atoms, respectively. 8 , 9 These characteristics might be owing to a large number of grain boundaries (GBs).…”

Si and Cr Doping Effects on Growth and Mechanical Properties of UltrananocrystallineDiamond/Amorphous Carbon Composite Films Deposited on Cemented Carbide Substrates by Coaxial Arc Plasma Deposition

“…grain size is comparable to that of UNCD/a-C films deposited on Si substrates. Whereas films deposited on Si at a substrate temperature of 550 °C exhibit a hardness of approximately 23 GPa 21) , a film (Sample 1) deposited on WC-Co substrate exhibit a hardness of 17.3 GPa, as shown in Table 1. The hardness is slightly degraded by employing WC-Co substrates.…”

Effect of Surface Chemical Bonding States on Lithium Intercalation Properties of Surface‐Modified Lithium Cobalt Oxide

“…One distinctive application of this approach is surface coating ,. The coating layers fabricated by APD with a moderately high ion energy are highly uniform and adhesive, even when fabricated at room temperature, compared to those synthesized by other PVD techniques. Thus, the APD technique has been applied to synthesize TiN and ZrN as well as ZrO 2 films as coatings .…”