1995
DOI: 10.1016/0379-6779(94)03033-3
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Structural and electrical characteristics of copper indium disulfide thin film

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Cited by 10 publications
(4 citation statements)
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“…The grain size of the crystals in the undoped and Sb-doped thin films annealed at 400 C was approximately 0.2-0.4 and 0.8-1.0 m, respectively, with the grain size of the Sb-doped CuInS 2 crystals larger than that of the undoped CuInS 2 crystals as well as Sb-doped CuInSe 2 , 17) and Cu(In,Ga)Se 2 [19][20][21] thin films. The observed grain size of the Sb-doped CuInS 2 crystals prepared by the present method was smaller than that reported for undoped CuInS 2 crystals prepared by electron beam evaporation 22) and chemical vapor deposition. 23)…”
Section: Resultscontrasting
confidence: 76%
“…The grain size of the crystals in the undoped and Sb-doped thin films annealed at 400 C was approximately 0.2-0.4 and 0.8-1.0 m, respectively, with the grain size of the Sb-doped CuInS 2 crystals larger than that of the undoped CuInS 2 crystals as well as Sb-doped CuInSe 2 , 17) and Cu(In,Ga)Se 2 [19][20][21] thin films. The observed grain size of the Sb-doped CuInS 2 crystals prepared by the present method was smaller than that reported for undoped CuInS 2 crystals prepared by electron beam evaporation 22) and chemical vapor deposition. 23)…”
Section: Resultscontrasting
confidence: 76%
“…Ternary chalcopyrite semiconductors ABX 2 (A = Cu, Ag; B = Al, In, Ga; X = S, Se, Te) show considerable technological potential for a wide variety of optoelectronic device applications [1][2][3]. Of all the ABX 2 chalcopyrites which make use of alternative or clean energy, CuInS 2 has been receiving considerable attention as a photovoltaic conversion device [4,5]. Its band gap of about 1.5 eV is almost the optimum for the photovoltaic conversion of solar energy (note that the band gap is close to that of GaAs).…”
Section: Introductionmentioning
confidence: 99%
“…The grain sizes of CuInS 2 particles increase with increasing annealing temperature. The grain size in the non-doped films grown by this method is almost the same as films grown by electron beam evaporation and CVD methods [18,19].…”
mentioning
confidence: 90%