2017
DOI: 10.1007/s12274-017-1622-3
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Strain-induced band gap engineering in layered TiS3

Abstract: By combining ab initio calculations and experiments we demonstrate how the band gap of the transition metal tri-chalcogenide TiS 3 can be modified by inducing tensile or compressive strain. We show by numerical calculations that the electronic band gap of layered TiS 3 can be

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Cited by 39 publications
(39 citation statements)
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“…In contrast, for the monolayer, superficial S vacancies lightly affect the electronic properties. 153 Recently, considerable attention on strain induced band-gap modulation on MX3 has been drawn 25,26,48,147,[154][155][156][157] . The ability to control the band gap and its nature can have a wide impact on the use of TMTCs, and in particular TiS3, for optical applications.…”
Section: Electronic Structurementioning
confidence: 99%
See 2 more Smart Citations
“…In contrast, for the monolayer, superficial S vacancies lightly affect the electronic properties. 153 Recently, considerable attention on strain induced band-gap modulation on MX3 has been drawn 25,26,48,147,[154][155][156][157] . The ability to control the band gap and its nature can have a wide impact on the use of TMTCs, and in particular TiS3, for optical applications.…”
Section: Electronic Structurementioning
confidence: 99%
“…The ability to control the band gap and its nature can have a wide impact on the use of TMTCs, and in particular TiS3, for optical applications. Indeed, by inducing tensile or compressive strain in certain directions of the unit cell one can either increase or decrease the band gap 155 . In 12 addition to this, a direct-indirect gap transition can be induced in TiS3 layered materials by applying a compressive strain in the easy electronic transport direction 155 .…”
Section: Electronic Structurementioning
confidence: 99%
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“…For instance, in contrast to the layered TMDCs, TiS 3 exhibits a direct band gap in both monolayer and bulk form of about 1 eV. It is important to note that the band gap and its direct character depend very slightly on the thickness and the stacking order of the constituent layers [23][24][25][26]; it changes slightly on the other hand with the application of tensile stress to the material [27]. It has also been shown that TiS 3 transistors show very high electron mobility and the current-voltage characteristics exhibit strong nonlinearity [28,29].…”
Section: Introductionmentioning
confidence: 99%
“…Titanium trisulfide (TiS3) is a layered semiconductor which has attracted much attention recently thanks to its quasi-1D electronic and optoelectronic properties [15][16][17][18] and its direct bandgap of 1.1 eV [19][20][21][22][23][24][25] . Using first-principles calculations, Iyikanat et al showed that TiS3 can react with various forms of oxygen 26 .…”
Section: Main Textmentioning
confidence: 99%