2007
DOI: 10.1016/j.surfcoat.2007.03.051
|View full text |Cite
|
Sign up to set email alerts
|

Step coverage of thin titania films on patterned silicon substrate by pulsed-pressure MOCVD

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

2
20
0

Year Published

2009
2009
2013
2013

Publication Types

Select...
7

Relationship

3
4

Authors

Journals

citations
Cited by 23 publications
(22 citation statements)
references
References 10 publications
2
20
0
Order By: Relevance
“…The well-mixed reactor condition means that a relatively simple modelling approach to the deposition kinetics can be considered [20]. A research scale PP-MOCVD system constructed at a cost of less than $30,000 USD and reliably operating for more than 7 years and has been used to deposit micro and nano-scale conformal layers [24,25]. Fig.…”
Section: Pp-mocvd Process Design Considerationsmentioning
confidence: 99%
See 1 more Smart Citation
“…The well-mixed reactor condition means that a relatively simple modelling approach to the deposition kinetics can be considered [20]. A research scale PP-MOCVD system constructed at a cost of less than $30,000 USD and reliably operating for more than 7 years and has been used to deposit micro and nano-scale conformal layers [24,25]. Fig.…”
Section: Pp-mocvd Process Design Considerationsmentioning
confidence: 99%
“…The effect of internal positioning of heated substrates in the reactor volume was investigated by carrying out depositions on flat stainless steel plates heated by induction coil. PP-MOCVD depositions using titanium isopropoxide precursor in toluene, as described elsewhere [24], were carried out on square stainless steel plates (65 × 65 × 5 mm). All depositions were done under the same conditions: 400°C substrate temperature measured on substrate surface, 500 pulses, precursor concentration of 5 mol%, and sample loop volume of 250 μl.…”
Section: Experimental Design Validationmentioning
confidence: 99%
“…The pressure varies rapidly with time and the precursor flow in the reactor chamber is unsteady. Experimental evidence has shown the resultant flow regime produces a uniform reactant mass flux within the reactor, which results in highly uniform thin films with high precursor conversion efficiencies (4,5,6). …”
Section: Pulsed-pressure Cvd (Pp-cvd) Is a New Deposition Technique Wmentioning
confidence: 99%
“…The mass transport is characterized by expansion-dominated gas dynamics that result in a well-mixed reactor condition during deposition, and uniform precursor arrival rate, even on complex shapes. [23] Thus, PP-MOCVD is being investigated as a possible method of coating the bone/interface surfaces of complex-shaped bone replacements and the porous scaffold surfaces of joint replacement implants. [24] Because the technique uses a vacuum and high temperature, it could fit into the sterile manufacturing line for orthopaedic joint replacements.…”
Section: Introductionmentioning
confidence: 99%