Sputtering in mercury ion thrusters

Mantenieks, M. A.; Rawlin, Vincent K.

doi:10.2514/6.1979-2061

Cited by 6 publications

(4 citation statements)

References 45 publications

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“…Deposition modelling additionally requires differential (angular) sputter yields (y(α, φ)) in order to track the trajectories of sputtered particles. Total and differential sputter yield profiles have been measured with a multitude of techniques, a partial list of which includes weight loss [10,12], collector plates [13,14], mass spectrometry [15], quartz crystal microbalance (QCM) [3-7, 9-11, 16, 17], Rutherford backscattering [18,19], radioactive tracers [20] and cavity ring-down spectroscopy [21,22].…”

Section: Introductionmentioning

confidence: 99%

Total and differential sputter yields of boron nitride measured by quartz crystal microbalance

Rubin

Topper

Yalin

2009

J. Phys. D: Appl. Phys.

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We present differential sputter yield measurements of boron nitride due to bombardment by xenon ions. A four-grid ion optics system is used to achieve a collimated ion beam at low energy (<100 eV). A quartz crystal microbalance is used to measure differential sputter yield profiles of condensable components from which total sputter yields can also be determined. We report total and differential sputter yields of three grades of boron nitride due to bombardment by xenon ions for ion energies in the range 60–500 eV and ion incidence angles of 0°, 15°, 30° and 45° from the normal. Comparisons with published values are made where possible.

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Section: Introductionmentioning

confidence: 99%

Total and differential sputter yields of boron nitride measured by quartz crystal microbalance

Rubin

Topper

Yalin

2009

J. Phys. D: Appl. Phys.

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“…Differential sputter yield profiles are of basic interest for physical understanding of the sputtering process [1,10] and of interest in EP applications for modelling of redeposition (and contamination effects) of sputtered particles. Differential sputter yield profiles have been measured with a multitude of techniques, a partial list of which includes: collector plates [11,12], mass spectrometry [13], quartz crystal microbalance [6][7][8][9]14,15], Rutherford backscattering [16,17], radioactive tracers [18] and cavity ring-down spectroscopy [19]. The current measurement system builds upon our previous work using a quartz crystal microbalance (QCM) for sensitive measurements of angularly resolved differential sputter yields [8,9].…”

Section: Introductionmentioning

confidence: 99%

Differential sputter yield profiles of molybdenum due to bombardment by low energy xenon ions at normal and oblique incidence

Yalin¹,

Williams²,

Surla³

et al. 2007

J. Phys. D: Appl. Phys.

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We report differential sputter yield measurements for Xe+ ions incident on molybdenum for ion incidence angles of 0°, 15°, 30° and 45°, and ion energies of 250, 350, 500 and 750 eV. The angularly resolved profiles are obtained with a quartz crystal microbalance that is moved to a series of locations above the target. Total sputter yields found by integrating the differential sputter yields are in accord with the literature values. For normally incident ions the profiles are under-cosine, while for obliquely incident ions the profiles show azimuthal variation with pronounced forward sputtering lobes. We discuss the use of published expressions from Zhang and Zhang (2004 Radiat. Eff. Defects Solids 159 301–7) for describing the measured profiles. We find that the profiles can be reasonably described with these expressions by using two free parameters: the total sputter yield (Y) and a characteristic energy (E*). We compare changes in angular sputtering profiles from lightly versus heavily sputtered targets.

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“…1 Detailed measurements of the erosion rate of various materials due to xenon ion bombardment have been reported previously, [2][3][4] and the results in the literature surveyed in Ref. 5. The previous measurements have been restricted to energies above 100 eV, and at 100 eV the literature shows a range in molybdenum sputtering yields of over 1 order of magnitude.…”

Section: Introductionmentioning

confidence: 99%

Sputtering yield measurements during low energy xenon plasma bombardment

Doerner

Whyte

Goebel³

2003

Journal of Applied Physics

149

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The sputtering yields of molybdenum, titanium, beryllium, and carbon have been measured during xenon ion bombardment from a plasma in the energy range between 10 and 200 eV. The erosion rates of Mo, Be, and C are measured both spectroscopically in the plasma and using the standard weight loss technique. Spectroscopic measurements of Ti sputtering yields, where no atomic physics data is available, are normalized to the weight loss measurements. The erosion rates of the metals decrease with the reduced mass of the metal-xenon combination and decrease with the increasing metal's binding energy, as expected. The erosion results for bombardment of graphite indicate that the sputtering rate of carbon, as atoms, from the surface is insufficient to explain the total carbon weight loss measured. The multiple mechanisms for carbon erosion during plasma bombardment are discussed and the sputter rates of carbon atoms and carbon dimers are presented.

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Sputtering in mercury ion thrusters

Cited by 6 publications

References 45 publications

Total and differential sputter yields of boron nitride measured by quartz crystal microbalance

Total and differential sputter yields of boron nitride measured by quartz crystal microbalance

Differential sputter yield profiles of molybdenum due to bombardment by low energy xenon ions at normal and oblique incidence

Sputtering yield measurements during low energy xenon plasma bombardment

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