Sputtering and emission intensity of copper alloys in a grimm glow lamp

Yamada, Tadahiko; Kashima, Jiro; Naganuma, Katsuyoshi

doi:10.1016/s0003-2670(01)93574-3

Cited by 11 publications

(4 citation statements)

References 6 publications

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“…It has been reported that the deposition condition and nature of the alloy target have great effect on the composition of the film sputtered from an alloy target. [34][35][36][37][38] Thus concentration of the deposited films deviates from that of the alloy target due to the difference of sticking coefficient, atom mass and surface binding energy of Cu and Al in the alloy target. Actual content of Al element of the films is shown in Table 1.…”

Section: Fabrication and Characterization Of The Sensorsmentioning

confidence: 99%

Ultrasensitive Strain Sensors Based on Cu‐Al Alloy Films with Voided Cluster Boundaries

Chen

Luo

et al. 2021

Adv Materials Technologies

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Stimulated by the requirement for wearable electronics, crack‐based strain sensors made from polymer‐supported metal films have been reported as a prospective structure for detecting subtle deformation with ultrahigh sensitivity and excellent flexibility. However, the regulation of crack preparation remains a challenge and the use of noble metals retards the large‐scale promotion toward practical application. Here, a cost‐effective strain sensor with ultrahigh strain sensitivity under small strains (ε) is designed based on the submicron to nanoscale voided clusters in Cu‐Al alloy films. The formation of channel cracks in the film is manipulated by regulating the intrinsic microstructure of the film, and the corresponding mechanism is discussed in detail. The strain sensor developed from the cracked Cu‐Al film exhibits ultrahigh gauge factors as high as 584 (0% < ε < 0.5%), 10219 (0.5% < ε < 0.9%), 43152 (0.9% < ε < 1.75%) which is among the highest in reported values. Furthermore, the practical application of the developed sensor in wearable electronics and detection of small deformation is demonstrated. This work provides a novel approach to optimize the sensing performance of flexible strain sensors.

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Section: Fabrication and Characterization Of The Sensorsmentioning

confidence: 99%

Ultrasensitive Strain Sensors Based on Cu‐Al Alloy Films with Voided Cluster Boundaries

Chen

Luo

et al. 2021

Adv Materials Technologies

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“…127 Although metallurgical structure influences the intensity of spectral emission, as detected for A1 -Cu (1-12%) alloys, nonetheless it was noted that their intensity ratio remains constant and can therefore be utilised independently of the said parameter. 128 Twelve binary Cu -Zn alloys (500-900 mg g-1 of Cu, Wieland-Werke AG) were analysed in order to establish measurement precision and accuracy. 129 Both were comparable with those achieved with ICP-AES.…”

Section: Selected Applicationsmentioning

confidence: 99%

Low-pressure discharges: fundamental and applicative aspects. A review

Caroli¹

1987

J. Anal. At. Spectrom.

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of Contents 1 Introduction 1 .I. Historical 1.2. General Description and Properties 2 Principles of Operation 2.1. Glow Discharge with a Planar Cathode 2.2. Hollow-cathode Discharge 3 Instrumentation 3.1. Basic Versions of Planar Cathode Glow Discharge lubes 3.2. Basic Versions of Hollow-cathode Tubes 4 Analytical Performance 4.1. Procedures for Sample Introduction 4.2. Selected Applications 4.2.1. Recent uses of planar-cathode glow discharges 4.2.1 .I. Analysis of metals and alloys 4.2.1.2. Analysis of refractory materials 4.2.1.3. Analysis of solutions 4.2.1.4. Analysis of gases 4.2.1.5. Miscellaneous 4.2.2. Recent uses of hollow-cathode discharges 4.2.2.1. Analysis of metals and alloys 4.2.2.2. Analysis of refractory materials 4.2.2.3. Analysis of solutions 4.2.2.4. Analysis of gases 4.2.2.5. Miscellaneous

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“…An abnormal glow discharge region (2) has been employed in earlier works of GDS (3)(4)(5). By use of this region, enough intensity of atomic emission can be observed due to the relatively high primary ion density.…”

Section: Analysis Of Binary Alloy Surfaces By Low Wattage Glow Discha...mentioning

confidence: 99%

“…As the particles emitted are predominantly neutral atoms in the ground state (13), the number of the removed atoms which are introduced into the plasma is given by ATa = jJA(t) (4) where ;a is the primary ion current density, Ya is the sputtering yield of element a, and 0a(i) is the fractional surface coverage of element a at the time of t. In the Cu-Ni system, copper surface concentration CCu(t) can be expressed by the fractional coverage of copper 0Cu(t) and of nickel 0Ni(f) at time t as follows: Ccu(t) = eCu(t)/(eCu(t) + 0Ni(t)) (5) By use of eq 3 and eq 4, eq 5 can be transformed into eq 6 cat) = aCu(í)/M0)/[(/Cu(f)/M0) + (You/y^i (6) where R' can be derived from the related calibration curve (see Table III).…”

Section: Dependence Of Normalized Intensity Upon Inputmentioning

confidence: 99%