Analysis of binary alloy surfaces by low wattage glow discharge emission spectrometry

Wagatsuma, Kazuaki; Hirokawa, Kichinosuke

doi:10.1021/ac00267a025

Cited by 31 publications

(9 citation statements)

References 22 publications

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“…The technique of cathodic sputtering in a glow discharge has previously been used in the analysis of samples by absorption (1)(2)(3)(4)(5)(6)(7)(8)(9)(10)(11), emission (12-30), fluorescence (31)(32)(33)(34)(35)(36), and mass spectrometry (37)(38)(39)(40)(41)(42). Cathodic sputtering has also been used in more fundamental spectroscopic investigations (43)(44)(45)(46)(47)(48)(49)(50)(51)(52)(53)(54)(55)(56). A scanning electron microscope has been used to study the microstructure arising on the cathode surface with various experimental conditions during ionic bombardment (57)(58)(59).…”

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confidence: 99%

Fundamental studies of a gas-jet-enhanced sputtering system for atomic spectroscopy

Kim¹,

Piepmeier²

1988

Anal. Chem.

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The use of gas jets In a sputtering cell makes this direct sampling method practical for atomic absorption spectrophotometry determinations. With a single-jet glow discharge source, the gas jet Increases absorbance by a factor of 40. An additional increase In absorbance by a factor of 5 is obtained with time-resolved observations when the jet flow is suddenly turned on. With a commercial six-jet sampling cell that directly atomizes solid samples for conventional atomic

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confidence: 99%

Fundamental studies of a gas-jet-enhanced sputtering system for atomic spectroscopy

Kim¹,

Piepmeier²

1988

Anal. Chem.

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“…As already discussed elsewhere (12), the intensity ratio (IJIb) of resonance emission lines for two different elements a and b is approximately given by h/h = R(NJNh)…”

Section: Theoretical Sectionmentioning

confidence: 64%

“…We have reported the results on several alloy systems using this low power glow discharge spectrometry (11,12). The variation of emission intensities, which probably depends on the sputtering yields of constituent elements in an alloy, has been observed especially in very low wattage regions.…”

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confidence: 99%

Emission spectroscopic studies of sputtering in a low-power glow discharge

Wagatsuma¹,

Hirokawa²

1984

Anal. Chem.

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“…The expression can be used to express the relation. We designate the term pa+ in (4): (4) the surface sputter index. Changes in the surface composition can be monitored with value p. a is the preferentially sputtered species.…”

Section: Theoreticalmentioning

confidence: 99%

Glow discharge sputtering of alloys observed by atomic absorption spectroscopy

Teo¹,

Hirokawa²

1987

Surface & Interface Analysis

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Sputtering procedures are often employed in the field of material preparation such as thin films and surface analysis. In this report the atomic absorption spectroscopic technique is applied to observe sputtering phenomena of typical binary alloys of copper-nickel and copper-silver, as occurring in a hollow cathode glow discharge. A parameter pa+ correlating the composition of the sample with the composition of the produced plasma which was measured with atomic absorption spectroscopy, is used to monitor changes in the surface composition. Measurements at a natural high surface temperature of the sample during glow discharge and at a lower temperature by cooling with liquid nitrogen were performed. AES analysis of the glow discharge sputtered surfaces of uncooled samples show that a very deep altered layer can be produced.

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Analysis of binary alloy surfaces by low wattage glow discharge emission spectrometry

Cited by 31 publications

References 22 publications

Fundamental studies of a gas-jet-enhanced sputtering system for atomic spectroscopy

Fundamental studies of a gas-jet-enhanced sputtering system for atomic spectroscopy

Emission spectroscopic studies of sputtering in a low-power glow discharge

Glow discharge sputtering of alloys observed by atomic absorption spectroscopy

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