Fundamental studies of a gas-jet-enhanced sputtering system for atomic spectroscopy

Kim, Hyo J.; Piepmeier, Edward H.

doi:10.1021/ac00170a012

Cited by 46 publications

(12 citation statements)

References 76 publications

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“…The characteristics of the FFGD ion source for inorganic elemental analysis have been extensively studied, [25][26][27][28][29][30][31] demonstrating good sensitivity for most elements. However, the potential of the technique for wider analytical use has not previously been investigated.…”

Section: Introductionmentioning

confidence: 99%

Gas chromatography combined with fast flow glow discharge mass spectrometry (GC-FFGD-MS)

Newman

Mason

2004

J. Anal. At. Spectrom.

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A low power (v5 W) dc fast flow glow discharge (FFGD) ion source has been adapted for the detection of halogenated hydrocarbons using gas chromatography as the sample introduction technique. A simple and robust interface design enabled direct coupling of the ion source to a common gas chromatograph. After optimisation, detection limits for four compounds were from 0.3-66.5 pg (by monitoring the halogen ions 35 Cl, 79 Br and 127 I). The source operating conditions can be 'tuned' to obtain different information, allowing both sensitive elemental detection and structure elucidation using a single instrument, with sub-pg detection limits for the bromobenzene molecular ion. The source pressure, power and discharge gas flow rate were found to have significant effects on the relative fragment ions detected. These observations can be rationalised using neutral, excited state chemistry.

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Section: Introductionmentioning

confidence: 99%

Gas chromatography combined with fast flow glow discharge mass spectrometry (GC-FFGD-MS)

Newman

Mason

2004

J. Anal. At. Spectrom.

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“…Glow discharge devices (1) are finding broad analytical use as sources of atoms and ions for atomic absorption (2)(3)(4), atomic emission (5)(6)(7), atomic fluorescence (8-11), resonance ionization (12), and mass spectrometry (13)(14)(15)(16). With continuing research and development into quadrupole based instruments for glow discharge mass spectrometry, along with the installation of a commercial magnetic sector system (17) in an estimated 20 user laboratories (18), applications of glow discharge mass spectrometry appear to be on the verge of a significant expansion.…”

Section: Introductionmentioning

confidence: 99%

Assessment of the relative role of Penning ionization in low-pressure glow discharges

Smith¹,

Serxner²,

Hess³

1989

Anal. Chem.

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Optical Investigations Into the relative role of Penning Ionization as a mechanism for the Ionization of sputtered species In low-pressure argon glow discharges were carried out. These studies employed methane as a quenching agent to effectively reduce the argon metastable population. This reduction of metastable atoms significantly limits the extent of Penning Ionization present In the discharge, which will decrease ion emission signals from the sputtered species. The magnitude of the decrease In these Ion emission signals may then be related to the relative importance of the Penning Ionization process In overall discharge Ionization of the sputtered species. These studies show Penning ionization to account for approximately 40-80% of the ionization of sputtered species, depending upon discharge conditions of current and pressure.

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“…An enhancement of the absorbance by a factor five [3] is reported. Figure 5a shows the effect of the gas flow rate on the absorbance using various pressures in the RF-GDAAS.…”

Section: Effect Of Power On the Absorbance Weight Loss And DC Bias Pmentioning

confidence: 89%

“…Bernhard [2] used the Atomsource TM for the analysis of metals and alloys by AAS. Kim and Piepmeier [3] demonstrated that the use of six gas jets significantly increases the sample loss rate over that provided by a static system (no gas flow). Bank and Blades [4][5][6][7][8] investigated the possible use of the gas jet assisted GD as a source for AES.…”

Section: Introductionmentioning

confidence: 99%

Studies of gas-jet assisted RF-glow discharge atomic absorption spectrometry

Choi

Kim

1996

Analytical and Bioanalytical Chemistry

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The gas jet assisted glow discharge source has been employed for the RF-glow discharge atomic absorption spectrometry (RF-GDAAS). Data are described to illustrate the role of discharge power, pressure as well as gas flow rate on the sample loss rate, absorbance and self-bias potential. Results show that the optimum discharge conditions depend not only on the pressure and discharge power but also on the gas flow rate. The absorbance increases as much as 1 order of magnitude as the gas flow rate increases from 50 mL/min to 500 mL/min at a pressure of 3 mbar. The use of a gas-jet source allows the direct analysis of solids by RF-GDAAS.

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Fundamental studies of a gas-jet-enhanced sputtering system for atomic spectroscopy

Cited by 46 publications

References 76 publications

Gas chromatography combined with fast flow glow discharge mass spectrometry (GC-FFGD-MS)

Gas chromatography combined with fast flow glow discharge mass spectrometry (GC-FFGD-MS)

Assessment of the relative role of Penning ionization in low-pressure glow discharges

Studies of gas-jet assisted RF-glow discharge atomic absorption spectrometry

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