Emission spectroscopic studies of sputtering in a low-power glow discharge

Wagatsuma, Kazuaki; Hirokawa, Kichinosuke

doi:10.1021/ac00276a010

Cited by 19 publications

(4 citation statements)

References 26 publications

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“…The technique of cathodic sputtering in a glow discharge has previously been used in the analysis of samples by absorption (1)(2)(3)(4)(5)(6)(7)(8)(9)(10)(11), emission (12-30), fluorescence (31)(32)(33)(34)(35)(36), and mass spectrometry (37)(38)(39)(40)(41)(42). Cathodic sputtering has also been used in more fundamental spectroscopic investigations (43)(44)(45)(46)(47)(48)(49)(50)(51)(52)(53)(54)(55)(56). A scanning electron microscope has been used to study the microstructure arising on the cathode surface with various experimental conditions during ionic bombardment (57)(58)(59).…”

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confidence: 99%

Fundamental studies of a gas-jet-enhanced sputtering system for atomic spectroscopy

Kim¹,

Piepmeier²

1988

Anal. Chem.

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The use of gas jets In a sputtering cell makes this direct sampling method practical for atomic absorption spectrophotometry determinations. With a single-jet glow discharge source, the gas jet Increases absorbance by a factor of 40. An additional increase In absorbance by a factor of 5 is obtained with time-resolved observations when the jet flow is suddenly turned on. With a commercial six-jet sampling cell that directly atomizes solid samples for conventional atomic

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confidence: 99%

Fundamental studies of a gas-jet-enhanced sputtering system for atomic spectroscopy

Kim¹,

Piepmeier²

1988

Anal. Chem.

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“…As discussed in detail in Ref. 10, the contribution of self absorption to the observed intensity ratio can be neglected when these two emission lines are employed in the low power glow discharge regions (4-15 W). Further, it is experimentally confirmed that no interferences with gas emission or the other atomic emission lines exist with respect to the selected lines.…”

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confidence: 99%

Observation of CuNi alloy surfaces by low wattage glow discharge emission spectrometry

Wagatsuma

Hirokawa

1984

Surface & Interface Analysis

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Glow discharge sputtering on Cu-Ni alloy surfaces is studied by optical emission spectroscopy and Auger electron spectroscopy. The relative intensity of Cu emission lines against Ni lines increases with a decrease in supplied power in very low wattage regions. These changes of the relative intensities principally depend on the sputtering parameters of constituent elements in Cu-Ni alloy; that is, the preferential sputtering of copper. Surface analysis by Auger electron spectroscopy shows that when samples are sputtered by glow discharges in very low power operations, the deformation layer which has a nickel-enriched composition exists on alloy surfaces. We discuss the effect of glow discharge sputterings on surface compositions using the two analytical methods described above.Optical emission spectroscopy is a simple, accurate, and reliable analytical technique. In the usual light source such as arc or spark discharge, the sample introduction into the plasma results from melting or vaporization, and the sample surfaces are badly damaged ; therefore, these sources are unsuitable for analysing surfaces.The glow of discharge lamp suggested by W. Grimml,2 has some advantages for the study of the surfaces. In glow discharge emission spectrometry (GDS), the thermal damages described above are absent because the sampling into the plasma is based upon cathode ~puttering.~ The emission lines are sharp and the self absorption is small compared to other light sources: due to discharge under evacuated pressures. It is interesting to apply its sputtering mechanism to the study of surfaces. Applications of GDS for surface analysis have been carried out in several earlier works. '~5,' However, as cathode sputtering in an abnormal glow discharge region' is employed in these works, the erosion rate is relatively high. Therefore, the resolving power in depth is insufficient compared to that obtained with an ion eching gun equipped with AES or ESCA. On the other hand, mild sputtering conditions are realized in a low wattage glow discharge. We have reported the results of several alloy systems using this low power GDS.'' Especially in very low wattage regions, the variation of emission intensities, which probably depends on the sputtering yields of constituent elements in an alloy, has been observed. It is generally recognized that when an alloy surface is bombarded with primary ions, the surface composition changes from the bulk composition because of the so-called preferential sputtering. Copper-nickel binary alloys have been widely studied by many investigators and surface enrichment of Ni caused by ion bombardments has been reported. '-I6The aim ofthis work is to examine the relation between the measurements by low power GDS and those by Auger electron spectroscopy (AES) with respect to the surface composition in Cu-Ni alloys. The sputtered surfaces are subjected to AES while information about ejected atoms is obtained by GDS. Accordingly, it is expected that detailed knowledge about the sputterings in the GDS will be provided b...

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“…As the transitions among doublet terms are different from the excited energy levels belonging to the quartet terms to the ground state level, it is expected that the intensity ratio of quartet term to doublet term may vary under different experimental conditions. Wagatsuma and Hirokawa (13) showed that the intensity ratios of lines in the doublet state show no power dependence, while the intensity ratio of doublet state to quartet state lines decreased with increase in input power. These results may be explained in terms of the difference that exists between the energy levels of the excited states.…”

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confidence: 99%

“…4b with 150 ml/min main gas flow rate, indicates that the intensity of Cu II 224.70 nm increased by a factor of about 2. Several studies (12,13) (12). The energy difference is estimated to be only 0.02 eV; therefore, the Cu II 224.70 nm may be a charge transfer between this state and the ground state of the copper atom.…”

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confidence: 99%

Emission Characteristics of Jet Configurations for Jet-Boosted Glow Discharge Atomic Emission Spectrometry

Kim

Park

Lee

et al. 1998

Microchemical Journal

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Emission spectroscopic studies of sputtering in a low-power glow discharge

Cited by 19 publications

References 26 publications

Fundamental studies of a gas-jet-enhanced sputtering system for atomic spectroscopy

Fundamental studies of a gas-jet-enhanced sputtering system for atomic spectroscopy

Observation of CuNi alloy surfaces by low wattage glow discharge emission spectrometry

Emission Characteristics of Jet Configurations for Jet-Boosted Glow Discharge Atomic Emission Spectrometry

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