Sputtered molybdenum bilayer back contact for copper indium diselenide-based polycrystalline thin-film solar cells

Scofield, John; Duda, A.; Albin, D.; Ballard, Benjamin; Predecki, Paul

doi:10.1016/0040-6090(94)06462-8

Cited by 301 publications

(179 citation statements)

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“…Scofield et al, [2] reported a problem associated with the adhesion of Mo films on glass substrates at low argon sputtering pressures. These results are not only dependent on the pressure but also depend on the system geometry and configuration.…”

Section: Accepted M Manuscriptmentioning

confidence: 99%

“…In our case we have deposited films at the lowest pressure possible (7.0 x10 -1 Pa) and they were found to be well adhered to the glass substrate. A range of work has been reported on the stress/ strain related issues of films and their mechanical and electrical behaviour following deposition by the normal d.c sputtering method [2,[13][14][15][16][17]. There have been no studies conducted on the effect of stress or strain in pulsed d.c. magnetron sputtered films, especially from powdered targets.…”

Section: Accepted M Manuscriptmentioning

confidence: 99%

“…There have been no studies conducted on the effect of stress or strain in pulsed d.c. magnetron sputtered films, especially from powdered targets. The Mo thin films sputtered using ordinary d.c. [2,18] and r.f. [6] magnetron sputtering at low pressure were found to have compressive strain and showed low resistivity but our pulsed d.c. sputtered Mo films were found to have very high tensile strain with relatively high resistivity.…”

Section: Accepted M Manuscriptmentioning

confidence: 99%

“…The reason is partially historic and partly scientific [2]. A good back electrode should provide an ohmic contact with the p-type absorbing layer, have low resistivity and be well adhered to the glass substrate.…”

Section: Introductionmentioning

confidence: 99%

“…Sputtering is considered as one of the most important of these because it offers control over the different operating parameters and the ability to produce uniform layers with high reproducibility rates compared to other techniques such as thermal evaporation. Mo films in the past have been traditionally produced by d.c sputtering [2][3][4] or r.f sputtering [6]from a solid target. Various commercial industries such as Shell Solar, Würth Solar, Global Solar, Nanosolar, Ascent Solar, etc.. use sputtered Mo films on various substrates such as glass, steel or flexible polymer as a back contact for CIGS based solar cells [7].…”

Section: Introductionmentioning

confidence: 99%

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Nano-structured morphological features of pulsed direct current magnetron sputtered Mo films for photovoltaic applications

2011

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Nano-structured morphological features of pulsed direct current magnetron sputtered Mo films for photovoltaic applications, Thin Solid Films (2011Films ( ), doi: 10.1016Films ( /j.tsf.2011 This is a PDF file of an unedited manuscript that has been accepted for publication. As a service to our customers we are providing this early version of the manuscript. The manuscript will undergo copyediting, typesetting, and review of the resulting proof before it is published in its final form. Please note that during the production process errors may be discovered which could affect the content, and all legal disclaimers that apply to the journal pertain. Cu(In,Ga)Se 2 based solar cells and as such the properties of these layers play an important role in the overall cell structure. This paper describes the production of molybdenum films using pulsed d.c magnetron sputtering from compressed molybdenum powder targets. The films were deposited at different substrate temperatures under constant power and constant current modes, and analysed using X-ray diffraction, scanning electron microscopy, atomic force microscopy and four point resistance probe. Mechanical strain and resistivity were found to decrease with substrate temperature together with a shift in the (110) crystallographic plane towards higher diffraction angles. All films were well adhered to the glass substrates irrespective of their high tensile strain. Surface morphology analysis revealed the presence of nano-structured stress relief patterns which can enhance the nucleation sites for subsequent CuInSe 2 deposition. A high-resolution cross sectional image showed the columnar growth of the films. Surface roughness analysis revealed that roughness increased with increase in substrate temperature. A C C E P T E D M A N U S C R I P T ACCEPTED MANUSCRIPT KeywordsMolybdenum films, Pulsed D.C. Magnetron Sputtering, nano-structured stress relief pattern, powder sputtering, back contact layer.

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Section: Accepted M Manuscriptmentioning

confidence: 99%