2017
DOI: 10.1109/led.2017.2738616
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Split-Gate 1.2-kV 4H-SiC MOSFET: Analysis and Experimental Validation

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Cited by 65 publications
(31 citation statements)
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“…Also, the information of device geometry is usually not available to users [15]. As a result, they are mostly used at the design stage of SiC MOSFETs [16].…”
Section: Introductionmentioning
confidence: 99%
“…Also, the information of device geometry is usually not available to users [15]. As a result, they are mostly used at the design stage of SiC MOSFETs [16].…”
Section: Introductionmentioning
confidence: 99%
“…Reduced values for the HF-FOM are desired to achieve improved performance. HF-FOMs for 1.2 kV 4H-SiC power MOSFETs can be significantly improved using the split-gate (SG) and buffered-gate (BG) structures [8]- [10]. Substituting 1.2 kV devices with 2.3 kV devices in solar inverter applications allows using a single-level versus more complex and expensive 2-level and 3-level converters [11].…”
Section: Introductionmentioning
confidence: 99%
“…The split-gate concept is extended to 2.3 kV devices in this paper. For 1.2 kV 4H-SiC SG-MOSFETs, enhanced gate oxide electric field occurs at the SG electrode edge [8]. Optimization of the structure was required to make this electric field below 4 MV/cm to ensure reliable operation.…”
Section: Introductionmentioning
confidence: 99%
“…The SiC JBS diode is adopted in this work as a case study. SiC power devices have attracted worldwide attention because of the high critical breakdown field in SiC [18]-for example, SiC MOSFET with protruded p-base [19], split-gate SiC MOSFET [20], SiC diodes [21], and GaN/SiC hybrid field-effect transistors [22]. In this work, we present that the contact to the p-grid exerts little influence on the static characteristics of the SiC JBS diode, including the forward voltage drop (V F ) and the BV.…”
Section: Introductionmentioning
confidence: 99%