1998
DOI: 10.1016/s0040-6090(97)00820-1
|View full text |Cite
|
Sign up to set email alerts
|

Spectroscopic ellipsometry characterization of Ba0.7Sr0.3TiO3 thin films prepared by the sol-gel method

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

2
10
0

Year Published

2000
2000
2016
2016

Publication Types

Select...
6
1
1

Relationship

0
8

Authors

Journals

citations
Cited by 28 publications
(13 citation statements)
references
References 7 publications
2
10
0
Order By: Relevance
“…Gao et al [5] in their recent work have used in situ SE to study Ba 0.5 Sr 0.5 TiO 3 thin films deposited by ion beam sputtering. Their BST films showed n values higher than films prepared by the sol-gel method [7]. Their BST films showed n values higher than films prepared by the sol-gel method [7].…”
Section: Introductionmentioning
confidence: 82%
See 1 more Smart Citation
“…Gao et al [5] in their recent work have used in situ SE to study Ba 0.5 Sr 0.5 TiO 3 thin films deposited by ion beam sputtering. Their BST films showed n values higher than films prepared by the sol-gel method [7]. Their BST films showed n values higher than films prepared by the sol-gel method [7].…”
Section: Introductionmentioning
confidence: 82%
“…In the literature, there have been some studies on the optical properties of BaTiO 3 or BST films [4][5][6][7][8][9][10][11][12]. The works by Jellison et al [4], Gao et al [5], McKee et al [6], and Suzuki et al [7] have used SE to study BaTiO3 in the transparent region (lies below $3.4 eV).…”
Section: Introductionmentioning
confidence: 99%
“…The I-V characteristic for a (Ba 0.67 Sr 0.33 )Ti 1.02 O 3 sample measured at different temperatures is shown in Fig. 18 42 On the basis of the above experimental results and discussion, we can conclude that the Schottky emission model is the conduction mechanism in our amorphous BST thin films. 18.…”
Section: E Conduction Mechanismmentioning
confidence: 59%
“…STO ferroelectric thin film is the basis for realization of electronic integration. There are several technologies of preparing STO thin films which has a widely use in current application, such as Sol -gel (Sol-Gel) method [5][6] , chemical vapor deposition (CVD) method [7] , RF sputtering (RF) method [8] , molecular beam epitaxy (MBE) method [9] and pulsed laser deposition (PLD) method [10][11][12][13] and so on.…”
Section: Introductionmentioning
confidence: 99%