Spectroscopic diagnostic of an argon hydrogen RF inductive thermal plasma torch at atmospheric pressure used for silicon hydrogenation

Abstract

Hydrogenation of silicon materials has great advantages for its photovoltaic properties and is the key to elimination of crystalline defects during basaltic growth of the crystal. It is therefore interesting to characterize the plasma by optical emission spectroscopy methods in order to study hydrogenation of silicon particles during their treatment by an inductive thermal plasma burning in the Ar–H2 mixture.Excited states of atomic hydrogen n′ = 3–8, which are responsible for silicon hydrogenation, have been detected by the optical emission spectroscopy of the Balmer series lines. These hydrogen lines have been used to determine electronic density on the plasma axis. Furthermore, Ar I lines were used to estimate the electronic temperature by the Boltzmann plot method. The deviation from the local thermodynamic equilibrium of the plasma has also been estimated.

Modification of Aliphatic Self-Assembled Monolayers by Free-Radical-Dominant Plasma: The Role of the Plasma Composition

“…Whereas the portion of high-energy electrons and ions in such a plasma is massively reduced on the way from the excitation area to the afterglow region, long-living free radicals and some metastable species survive or get re-excited and provide the major etching effect, together with the ultraviolet light emitted by the plasma. 4,5 Recently, we used a nitrogen-oxygen microwave downstream plasma for the modification of aliphatic and aromatic thiol-derived self-assembled monolayers (SAMs) on Au and Ag substrates. 1,2,6 The plasma treatment resulted in significant changes of these monomolecular films.…”

“…Such a situation can be, for example, achieved in the afterglow region of a downstream plasma, which is frequently chosen for the purpose of surface cleaning, etching, or modification. Whereas the portion of high-energy electrons and ions in such a plasma is massively reduced on the way from the excitation area to the afterglow region, long-living free radicals and some metastable species survive or get re-excited and provide the major etching effect, together with the ultraviolet light emitted by the plasma. , …”

Two-Temperature Two-Dimensional Non Chemical Equilibrium Modeling of Ar–CO2–H2 Induction Thermal Plasmas at Atmospheric Pressure

“…Other researchers have been studying both the steady state and transient response for argon mixed with single molecular gas ICTP on LTE assumption. For example, Nishiyama et al [22], Cai et al [23] and Bourg et al [24] investigated the temperature and flow field for Ar-He, Ar-O 2 , Ar-N 2 and Ar-H 2 thermal plasmas in steady state.…”

CO2 and H2 Gas Mixture Inclusion Effect on Shrinkage of Ar Induction Thermal Plasmas

“…On the other hand, other researchers have been studying both the steady state and transient response for argon mixed with single molecular gas ICTP. For example, Nishiyama et al (3) , Cai et al (4) and Bourg et al (5) investigated the temperature and flow field for Ar-He, Ar-O 2 , Ar-N 2 and Ar-H 2 thermal plasmas in steady state. And then dynamic characteristics and also non-equilibrium analysis have been made for argon with single molecular gas (6) .…”