Spectrally resolved white–light phase–shifting interference microscopy for thickness–profile measurements of transparent thin film layers on patterned substrates

Debnath, Sanjit; Kothiyal, M. P.; Schmit, Joanna; Hariharan, P.

doi:10.1364/oe.14.004662

Cited by 57 publications

(34 citation statements)

References 14 publications

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“…The total spectral phase observed by the CCD camera is given by 1,15 φ(z, d, σ) = 4πσz + ψ(σ, d) (6) where z represents the distance from the reference plane to the top surface of the transparent film. The first term on the right-hand side of Eq.…”

Section: Measurement Of Surface Profile (Shutter 'Off')mentioning

confidence: 99%

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Determination of film thickness and surface profile using reflectometry and spectrally resolved phase shifting interferometry

Debnath

You

Kim

2009

Int. J. Precis. Eng. Manuf.

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Surface profiling and film thickness measurement play an important role for inspection in semi conductor industry. White light source had been used as scanning white light interferometry and spectrally resolved white light interferometry for determining surface and film thickness profile. These techniques however failed for thinner film. Recently, reflectometry and spectrally resolved white light interferometry was combined for the same. This technique used Fourier Transform for the calculation of phase in spectral domain with the use of Linnik interferometer. In this method a large amount of carrier offset (carrier fringes) is required to be effective. This carrier fringes in spectrally resolved white light interferometry was achieved by increasing the optical path difference between the test and the reference surface. But, Linnik interferometer cause defocusing problem to create these carrier fringes. We propose in this paper to combine reflectometry and spectrally resolved phase shifting interferometry for measurement of surface and film thickness profile with the use of Michelson objective. Michelson objective will be convenient to implement as compared to the Linnik type and the use of phase shifting interferometry does not necessarily need large number of fringes in the spectral domain.

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Section: Measurement Of Surface Profile (Shutter 'Off')mentioning

confidence: 99%

“…[2][3][4][5][6][7][8][9][10][11][12][13][14] Another technique using white light is spectrally resolved white light interferometry. 15 In this technique a white light interferogram is dispersed by a spectrometer and projected on a CCD camera. Each dispersed wavelength carries information about the test system.…”

Section: Introductionmentioning

confidence: 99%

Determination of film thickness and surface profile using reflectometry and spectrally resolved phase shifting interferometry

Debnath

You

Kim

2009

Int. J. Precis. Eng. Manuf.

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“…In the first case we obtained approximately the thickness d=389.8 nm and in the second case in the wavelength range from 390 to 1000 nm approximately the thickness d=392.6 nm (with the correlation coefficient as high as 0.99394). It should be stressed here that we can also use a simplified model with the wavelength-independent constants [23] that gives film thickness with a worse fit and lower accuracy. In order to determine the thicknesses of the SiO 2 thin film precisely, one has to know the exact optical constants for both the SiO 2 thin film and Si substrate.…”

Section: Resultsmentioning

confidence: 99%

Dispersive white-light spectral interferometry with absolute phase retrieval to measure thin film

Hlubina¹,

Ciprián²,

Luňáček³

et al. 2006

Opt. Express

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Abstract:We present a white-light spectral interferometric technique for measuring the absolute spectral optical path difference (OPD) between the beams in a slightly dispersive Michelson interferometer with a thin-film structure as a mirror. We record two spectral interferograms to obtain the spectral interference signal and retrieve from it the spectral phase, which includes the effect of a cube beam splitter and the phase change on reflection from the thin-film structure. Knowing the effective thickness and dispersion of the beam splitter made of BK7 optical glass, we use a simple procedure to determine both the absolute spectral phase difference and OPD. The spectral OPD is measured for a uniform SiO 2 thin film on a silicon wafer and is fitted to the theoretical spectral OPD to obtain the thin-film thickness. The theoretical spectral OPD is determined provided that the optical constants of the thin-film structure are known. We measure also the nonlinear-like spectral phase and fit it to the theoretical values in order to obtain the thin-film thickness.

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“…There have been some recent developments in 2-D quantitative phase microscopy. In phase-shifting interference microscopy [42,43], the quantitative phase image is obtained from a combination of three or more interferograms. There is also a noninterferometric method to extract quantitative phase images from differential focusing properties of bright-field intensity images alone [44,45].…”

Section: Quantitative Phase Microscopymentioning

confidence: 99%

Principles and techniques of digital holographic microscopy

2010

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Abstract. Digital holography is an emerging field of new paradigm in general imaging applications. We present a review of a subset of the research and development activities in digital holography, with emphasis on microscopy techniques and applications. First, the basic results from the general theory of holography, based on the scalar diffraction theory, are summarized, and a general description of the digital holographic microscopy process is given, including quantitative phase microscopy. Several numerical diffraction methods are described and compared, and a number of representative configurations used in digital holography are described, including off-axis Fresnel, Fourier, image plane, in-line, Gabor, and phase-shifting digital holographies. Then we survey numerical techniques that give rise to unique capabilities of digital holography, including suppression of dc and twin image terms, pixel resolution control, optical phase unwrapping, aberration compensation, and others. A survey is also given of representative application areas, including biomedical microscopy, particle field holography, micrometrology, and holographic tomography, as well as some of the special techniques, such as holography of total internal reflection, optical scanning holography, digital interference holography, and heterodyne holography. The review is intended for students and new researchers interested in developing new techniques and exploring new applications of digital holography. C 2010 Society of Photo-Optical Instrumentation Engineers.

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Spectrally resolved white–light phase–shifting interference microscopy for thickness–profile measurements of transparent thin film layers on patterned substrates

Cited by 57 publications

References 14 publications

Determination of film thickness and surface profile using reflectometry and spectrally resolved phase shifting interferometry

Determination of film thickness and surface profile using reflectometry and spectrally resolved phase shifting interferometry

Dispersive white-light spectral interferometry with absolute phase retrieval to measure thin film

Principles and techniques of digital holographic microscopy

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