Spatially selective biomolecules immobilization on silicon nitride waveguides through contact printing onto plasma treated photolithographic micropattern: Step-by-step analysis with TOF-SIMS chemical imaging

Gajos, Katarzyna; Budkowski, Andrzej; Petrou, Panagiota; Awsiuk, Kamil; Μισιακός, Κωνσταντίνος; Raptis, Ioannis; Kakabakos, Sotirios

doi:10.1016/j.apsusc.2019.145002

Cited by 4 publications

(2 citation statements)

References 42 publications

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“…The chemical maps of iso-PnBMA and BSA surface components ( Figure 8 ), and in particular, their color-coded composite representations ( Figure 8 c and f) reveal enhanced BSA (green, CNO – signal) presence in the regions close to the contact line of the three phases, that is, on the polymer plateau edges facing holes ( Figure 8 f) and at continuous rims ( Figure 8 c and f). Preferential adsorption close to a hydrophilic/hydrophobic interface γ SiO x P /γ iso-PnBMA P = 13.2/1.2 can be related to the amphiphilic nature of protein molecules, 55 rearranging their polar and nonpolar residues at the interface. 56 Enhanced protein adsorption at hydrophilic/hydrophobic interfaces, PS/PMMA 57 or PS/PNVP, 14 was reported previously.…”

Section: Resultsmentioning

confidence: 99%

Dewetting of Polymer Films Controlled by Protein Adsorption

et al. 2020

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The stability of the film poly( n -butyl methacrylate) (PnBMA) with different tacticities, prepared on silicon oxide and exposed to aqueous phosphate-buffered saline with different concentrations of bovine serum albumin ( C BSA between 0 and 4.5 mg/mL), was examined at temperatures close to the physiological limit (between 4 and 37 °C) with optical microscopy, contact angle measurements, atomic force microscopy, and time-of-flight secondary ion mass spectrometry. For PBS solutions with C BSA = 0, the stability of atactic PnBMA and dewetting of isotactic PnBMA was observed, caused by the interplay between the stabilizing long-range dispersion forces and the destabilizing short-range polar interactions. Analogous considerations of excess free energy cannot explain the retardation of dewetting observed for isotactic PnBMA in PBS solutions with higher C BSA . Instead, formation of a BSA overlayer, adsorbed preferentially but not exclusively to uncovered SiO x regions, is evidenced and postulated to hinder polymer dewetting. Polymer dewetting and protein patterning are obtained in one step, suggesting a simple approach to fabricate biomaterials with micropatterned proteins.

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Section: Resultsmentioning

confidence: 99%

Dewetting of Polymer Films Controlled by Protein Adsorption

et al. 2020

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“…Secondary ion mass spectrometry (SIMS) is a successful technique for analyzing sample surface and has made much progress in photoresist research. − Bi 3+ ion was used as a primary ion source to bombard the sample surface, and obtained the distribution information on PAGs, BPA-6-epoxy and 2-aminoanthracene in the vertical direction (Figure C). CN – ion is the characteristic ion of the 2-aminoanthracene and the content change reflects the vertical distribution of 2-aminoanthracene in the film.…”

Section: Resultsmentioning

confidence: 99%

Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography

et al. 2023

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2-Aminoanthracene was used as a nucleophilic additive in a molecular glass photoresist, bisphenol A derivative (BPA-6-epoxy), to improve advanced lithography performance. The effect of 2-aminoanthracene on BPA-6-epoxy was studied by electron beam lithography (EBL) and extreme ultraviolet lithography (EUVL). The result indicates that the additive can optimize the pattern outline by regulating epoxy cross-linking reaction, avoiding photoresist footing effectively in EBL. The EUVL result demonstrates that 2-aminoanthracene can significantly reduce line width roughness (LWR) for HP (Half-Pitch) 25 nm (from 4.9 to 3.8 nm) and HP 22 nm (from 6.9 to 3.0 nm). The power spectrum density (PSD) curve further confirms the reduction of roughness at medium and high frequency for HP 25 nm and the whole range of frequency for HP 22 nm, respectively. The study offers useful guidelines to improve the roughness of a chemically amplified molecular glass photoresist with epoxy groups for electron beam lithography and extreme ultraviolet lithography.

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Spatial modulation of biomolecules immobilization by fabrication of hierarchically structured PEG-derived brush micropatterns: An versatile cellular microarray platform

Zhao

Sha

et al. 2020

Applied Surface Science

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Spatially selective biomolecules immobilization on silicon nitride waveguides through contact printing onto plasma treated photolithographic micropattern: Step-by-step analysis with TOF-SIMS chemical imaging

Cited by 4 publications

References 42 publications

Dewetting of Polymer Films Controlled by Protein Adsorption

Dewetting of Polymer Films Controlled by Protein Adsorption

Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography

Spatial modulation of biomolecules immobilization by fabrication of hierarchically structured PEG-derived brush micropatterns: An versatile cellular microarray platform

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