Some properties of TiO2-layers prepared by mid-frequency and dc reactive magnetron sputtering

Szczyrbowski, J.; Bräuer, Günter; Ruske, M.; Teschner, G.; Zmelty, A.

doi:10.1016/s0022-3093(97)00239-1

Cited by 31 publications

(11 citation statements)

References 3 publications

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“…7a values (mentioned on the figures) of the parameters n 1 , k 1 , Rd identified in these real situations are compatible with those mentioned in the literature [11][12][13] for such compounds. The value of Rd is checked afterwards by measuring the thickness of the deposits with the tactile profilometry method.…”

Section: Sensitivity Of the In Situ Oti Diagnostic Techniquesupporting

confidence: 90%

Performances of interferometric optical transmission diagnostic for in situ and real-time control of magnetron sputtering deposition process

Perry¹,

Billard

Pigeat³

2008

Measurement

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Section: Sensitivity Of the In Situ Oti Diagnostic Techniquesupporting

confidence: 90%

Performances of interferometric optical transmission diagnostic for in situ and real-time control of magnetron sputtering deposition process

Perry¹,

Billard

Pigeat³

2008

Measurement

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“…Unfortunately, this is an unstable operation zone for metal targets and obtaining fully stoichiometric layers in this regime is difficult. 7 In order to combine the advantages of both oxide and metal targets, i.e. stable operation and high deposition rate, respectively, reactive sputtering from mixed metal-oxide targets has been examined.…”

Section: Introductionmentioning

confidence: 99%

Effect of the oxygen deficiency of ceramic TiO_2−x targets on the deposition of TiO₂ thin films by DC magnetron sputtering

Poelman

Tomaszewski

Poelman

et al. 2004

Surface & Interface Analysis

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The sputter deposition of stoichiometric TiO 2 thin films has been investigated, in view of photocatalytic application. DC magnetron sputtering from ceramic targets in an argon/oxygen atmosphere was chosen as the deposition technique. Composite TiO 2 -Ti targets with metallic Ti fraction from 0 to 70 wt% were prepared from TiO 2 and Ti powders following a standard ceramic procedure.The influence of target composition and sputter parameters on the film composition was examined by means of optical transmission measurements, XRD and XPS. From the former, optical absorption coefficients are calculated, which are used as a measure for the films' stoichiometry. Curve fitting of the Ti 2p 3/2 photoemission line yields the composition in terms of the presence of reduced species.Upon sputtering in argon, translucent layers are obtained for targets with up to 35 wt% Ti. For higher amounts, the optical absorption coefficient a at 550 nm increases and the layers become dark. With increasing metal Ti contribution and argon flow, more reduced Ti species contribute to the Ti 2p photoemission line.In reactive sputter mode, near-stoichiometric TiO 2−x films are obtained for low oxygen mole fractions. For higher oxygen contributions, reduced Ti species are increasingly present for all targets. This reduction is ascribed to active re-sputtering of the deposited layer by O − ions and the sputter yield difference between oxygen and titanium.

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“…For TiO 2 prepared by reactive magnetron sputtering and evaporation, it is shown that the phase compositions of the layers after deposition and after post-deposition annealing strongly depend on process conditions such as total pressure, reactive gas fraction and magnetic field [1]. Further, the electric power mode in magnetron sputtering influences significantly the ion energy distribution at the substrate [2], which in turn can have a tremendous effect on the morphology and phase composition of the deposited layer [3].…”

Section: Transport Simulations Applying Dsmc/picmcmentioning

confidence: 99%

“…In [24], the index of refraction was calculated for several TiO 2 supercells, having densities in the range between 3.21 g/cm 3 and 4.14 g/cm 3 . It could be shown that the refractive index rises with increasing film density and has values between 2.12 and 2.32 at a wavelength of 1000 nm.…”

Section: Calculation Of Optical Properties Applying Dftmentioning

confidence: 99%

Simulation in thin film technology

et al. 2015

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Braunschweig, Germany ABSTRACTSimulation and modeling find more and more their way into thin film technology. Beside theoretical models for layer design, pre-production design analysis, and real time process control, atomistic simulation techniques gain of importance. Here, especially classical procedures such as Direct Simulation and Particle-in-Cell Monte Carlo (DSMC/PIC-MC), kinetic Monte Carlo (kMC) and Molecular Dynamics (MD) as well as quantum mechanical techniques based on Density Functional Theory (DFT) have to be mentioned. These methods are applied in order to investigate the material transport inside the coating facilities, the thin film growth in dependence of characteristic process conditions, and the optical and electronic thin film properties. By combination of these atomistic techniques in a suitable manner, a multiple scale simulation model can be realized for investigating the influence of specific process conditions on the resulting layer properties. The further extension of this "virtual coater" concept with respect to rate equation models enables the possibility to investigate also the interaction of laser irradiation with the modeled thin film structures.

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Some properties of TiO2-layers prepared by mid-frequency and dc reactive magnetron sputtering

Cited by 31 publications

References 3 publications

Performances of interferometric optical transmission diagnostic for in situ and real-time control of magnetron sputtering deposition process

Performances of interferometric optical transmission diagnostic for in situ and real-time control of magnetron sputtering deposition process

Effect of the oxygen deficiency of ceramic TiO_2−x targets on the deposition of TiO₂ thin films by DC magnetron sputtering

Simulation in thin film technology

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Some properties of TiO2-layers prepared by mid-frequency and dc reactive magnetron sputtering

Cited by 31 publications

References 3 publications

Performances of interferometric optical transmission diagnostic for in situ and real-time control of magnetron sputtering deposition process

Performances of interferometric optical transmission diagnostic for in situ and real-time control of magnetron sputtering deposition process

Effect of the oxygen deficiency of ceramic TiO2−x targets on the deposition of TiO2 thin films by DC magnetron sputtering

Simulation in thin film technology

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Product

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Effect of the oxygen deficiency of ceramic TiO_2−x targets on the deposition of TiO₂ thin films by DC magnetron sputtering