2018
DOI: 10.1016/j.spmi.2018.05.014
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Some new insights into the impact of annealing on single stacking faults in 4H-SiC

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Cited by 10 publications
(21 citation statements)
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“…It follows from these results that the excess carriers can travel along SSFs at distances up to 50 μm that confirms the results obtained in Ref. and essentially exceeds the bulk diffusion length of 2 μm. Two possible reasons for this long travelling distance of partial dislocation outside the irradiation region can be considered.…”
Section: Resultssupporting
confidence: 91%
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“…It follows from these results that the excess carriers can travel along SSFs at distances up to 50 μm that confirms the results obtained in Ref. and essentially exceeds the bulk diffusion length of 2 μm. Two possible reasons for this long travelling distance of partial dislocation outside the irradiation region can be considered.…”
Section: Resultssupporting
confidence: 91%
“…A SSF shrink due to annealing was also observed in Ref. [3,10,14,26]. To explain this shrink one should take into account that the Fermi level shifts down with a temperature increase and can become lower than the SSF lowest level.…”
Section: Resultsmentioning
confidence: 54%
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