2021
DOI: 10.1016/j.mssp.2021.105920
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Solution-processed molybdenum oxide films by low-temperature annealing for improved silicon surface passivation

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Cited by 10 publications
(4 citation statements)
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“…Annealing in FGA also increased the implied V oc (i-V oc ) from 583 to 603 mV. However, the authors recognize that other papers have demonstrated that annealing in O 2 leads to better passivation [92]. Davis and Strandwitz also notes that annealing in O 2 has been shown to yield more oxidizing MoO x , and hence a higher work function from a greater extent of band bending [91].…”
Section: Molybdenum Oxidementioning
confidence: 89%
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“…Annealing in FGA also increased the implied V oc (i-V oc ) from 583 to 603 mV. However, the authors recognize that other papers have demonstrated that annealing in O 2 leads to better passivation [92]. Davis and Strandwitz also notes that annealing in O 2 has been shown to yield more oxidizing MoO x , and hence a higher work function from a greater extent of band bending [91].…”
Section: Molybdenum Oxidementioning
confidence: 89%
“…Davis and Strandwitz, in their characterization of MoO x films, found that MoO x , when deposited at 300 • C, had the structure of α-MoO x [91]. Another study found that annealing at 150 • C gives the best passivation; at this temperature and 200 • C, the MoO x film is amorphous, but when annealing temperature is increased to 250 • C, the MoO x film becomes crystalline with the orthorhombic structure [92]. The study similarly posits that the crystallinity may be the most important reason for why passivation quality degrades at higher temperatures.…”
Section: Molybdenum Oxidementioning
confidence: 99%
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“…On the other hand, high temperatures provide the phase change energy for the crystallization of the film. The β-MoO x phase initially present undergoes gradual crystallization to form the α-MoO x phase [126][127][128]. Compared with β-MoOx, α-MoO x causes a higher degree of lattice distortion on the silicon surface, which results in a higher surface density, indicating poor interface passivation [129].…”
Section: Field-effect Passivationmentioning
confidence: 99%