2012
DOI: 10.1021/am302009e
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Solution-Cast High-Aspect-Ratio Polymer Structures from Direct-Write Templates

Abstract: This letter presents a novel strategy for template synthesis of polymer structures with laser machined substrates. User-designed patterns of submicrometer holes with aspect ratios >10:1 and depths >10 μm were produced by focusing 160 fs, 5.2 μJ laser pulses on the surface of fused silica with a high numerical aperture microscope objective. Some holes were enlarged by chemical etching. Polymer solutions were cast into the templates to create high-aspect-ratio polymer structures using replication. Engineered pol… Show more

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Cited by 28 publications
(22 citation statements)
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References 23 publications
(36 reference statements)
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“…It offers freedom from expensive photomasks but requires increased patterning time and typically patterns with lower resolution. This technique has been used to successfully prepare molds for casting high‐aspect‐ratio polymeric structures . A variant is two‐photon patterning (sometimes referred to as direct‐write or multiphoton lithography), which irradiates the photoresist with a focused infrared laser .…”
Section: Fabrication Techniquesmentioning
confidence: 99%
See 2 more Smart Citations
“…It offers freedom from expensive photomasks but requires increased patterning time and typically patterns with lower resolution. This technique has been used to successfully prepare molds for casting high‐aspect‐ratio polymeric structures . A variant is two‐photon patterning (sometimes referred to as direct‐write or multiphoton lithography), which irradiates the photoresist with a focused infrared laser .…”
Section: Fabrication Techniquesmentioning
confidence: 99%
“…This technique has been used to successfully prepare molds for casting high-aspectratio polymeric structures. [170] A variant is two-photon patterning (sometimes referred to as direct-write or multiphoton lithography), which irradiates the photoresist with a focused infrared laser. [177] The high photon density in the focal point results in upconverted photons with UV energies, resulting in a smaller patterning region and enhanced resolution.…”
Section: Photolithographymentioning
confidence: 99%
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“…In the present work, femtosecond laser machining was carried out using the system described by Rajput. 38 A dry microscope objective, namely a Nikon CF Plan Achromat 79173, was used to focus the femtosecond laser beam on the surface of the fused silica wafer. Energy per pulse of 3.2 μJ was used to open each pore.…”
Section: Methodsmentioning
confidence: 99%
“…The use of laser equipment to cut and engrave materials is well established and used extensively throughout a wide range of industries. [4][5][6][7][8][9][10][11][12] The resolution of the resulting pattern is dependent on the quality of the laser engraver and is adjustable by following the parameters from the calibration. The particular "delicate" substrate used in the current manuscript is a porous breathable membrane based on polytetrafluoroethylene (PTFE) which was successfully used in previous studies to implement a three phase interface concept to breathe gases in as well as out of the electrochemical cells.…”
Section: Introductionmentioning
confidence: 99%