2015
DOI: 10.1063/1.4931514
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Solar cells with gallium phosphide/silicon heterojunction

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Cited by 8 publications
(2 citation statements)
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“…Once the q mesh is dense enough to correctly describe this divergence (66 × 66 × 66 mesh), the DG results are very similar to a full computation taking into account the variation of the e-ph matrix elements on a q mesh twice as dense as the k mesh (red crosses). There are few experimental data for the electron mobility in GaP with values between 200 and 330 cm 2 V −1 s −1 [78] but experiments are usually performed on polycrystalline samples. A more accurate description of transport properties in GaP would therefore require the inclusion of grain-boundary scattering effects that are beyond the scope of the present work.…”
Section: Phonon-limited Mobilitymentioning
confidence: 99%
“…Once the q mesh is dense enough to correctly describe this divergence (66 × 66 × 66 mesh), the DG results are very similar to a full computation taking into account the variation of the e-ph matrix elements on a q mesh twice as dense as the k mesh (red crosses). There are few experimental data for the electron mobility in GaP with values between 200 and 330 cm 2 V −1 s −1 [78] but experiments are usually performed on polycrystalline samples. A more accurate description of transport properties in GaP would therefore require the inclusion of grain-boundary scattering effects that are beyond the scope of the present work.…”
Section: Phonon-limited Mobilitymentioning
confidence: 99%
“…GaP possesses several attractive properties suited to electron‐selective contacts in silicon solar cells: a small conduction‐band offset, demonstrated high n‐type doping and conductivity, and even a small lattice mismatch (with [100] silicon), which introduces the possibility of epitaxial growth. Nevertheless, experimental demonstrations of GaP‐contacted Si devices fall short of the promising simulations 358–363 . A crucial limitation of this approach is the classical use of MOCVD or molecular‐beam epitaxy (MBE) to grow GaP, which is not standard for Si‐cell processing.…”
Section: Other Metal Compoundsmentioning
confidence: 99%