2022
DOI: 10.1038/s41565-021-01034-8
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Soft-lock drawing of super-aligned carbon nanotube bundles for nanometre electrical contacts

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Cited by 33 publications
(25 citation statements)
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“…By comparing the current map with a corresponding topography image (Figure S1a), we found that a CNT bundle (marked by (2)) exhibited a rather large current compared with individual CNTs (marked by (1)). It was presumably due to a large number of current paths in the bundles . The measured currents did not change with different gate biases, confirming a typical metallic property (Figure S1b).…”
Section: Resultsmentioning
confidence: 57%
“…By comparing the current map with a corresponding topography image (Figure S1a), we found that a CNT bundle (marked by (2)) exhibited a rather large current compared with individual CNTs (marked by (1)). It was presumably due to a large number of current paths in the bundles . The measured currents did not change with different gate biases, confirming a typical metallic property (Figure S1b).…”
Section: Resultsmentioning
confidence: 57%
“…The PV-RAMs were connected in series to sum the photovoltages, and the output voltage V ph = Σ( R 4×4 * P 4×4 ) performs a multiplication and sum operation (a convolution integral), with R 4×4 being the photovoltage responsivity matrix that represents the weights, P 4×4 being the photo intensity on each pixel as input. We note that there have been methods that massively fabricate carbon nanotube network devices 42 44 . Homogeneous WS 2 nanotube networks can be obtained with further investigation into the synthesis, purification, dispersion, and fabrication processes.…”
Section: Resultsmentioning
confidence: 99%
“…mobility of 17.4 cm 2 V −1 ·s −1 , SS of 120 mV·dec −1 , and on/off ratio of ∼10 7 . Such CNT mask strategy could be further improved by developing guided/self-aligned CNT growth methods to achieve ultra-clean SWCNT arrays with more controllable bundle density and very high degree of alignment (angle SD of ∼0.03°), which are essential to achieve large-scale fabrication of short-channel devices with superior performance and excellent uniformity ( Guo et al., 2022 ; Hong et al., 2010 ).
Figure 5 Channel length scaling of 2D transistors with nanogap (A) Upper: schematic diagram of nanogaps achieved by suspended SWCNT masks; Below: SEM image of the corresponding nanogaps in 7.5 nm.
…”
Section: Channel Length Scaling Of Transistorsmentioning
confidence: 99%