2005
DOI: 10.1016/j.mseb.2004.12.026
|View full text |Cite
|
Sign up to set email alerts
|

SnO2 films: formation, electrical and optical properties

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

4
22
0

Year Published

2006
2006
2017
2017

Publication Types

Select...
8
1

Relationship

0
9

Authors

Journals

citations
Cited by 45 publications
(27 citation statements)
references
References 21 publications
4
22
0
Order By: Relevance
“…These values are similar to those reported elsewhere [10,12]. It was observed from the carrier concentration (Nd) data that the FTO thin films exhibit n-type conductivity which is also achieved by other deposition techniques including spray pyrolysis and PLD [2,9].…”
Section: Electrical Propertiessupporting
confidence: 89%
See 1 more Smart Citation
“…These values are similar to those reported elsewhere [10,12]. It was observed from the carrier concentration (Nd) data that the FTO thin films exhibit n-type conductivity which is also achieved by other deposition techniques including spray pyrolysis and PLD [2,9].…”
Section: Electrical Propertiessupporting
confidence: 89%
“…Some techniques require a high substrate temperature to deposit the film, which can often cause the formation of intermediate semiconductor oxide layers at the film boundary [12]. Any post-treatment of the films, such as annealing, also poses additional operational costs and reduced throughput.…”
Section: Introductionmentioning
confidence: 99%
“…In general transition metals serve as "accelerators" of various processes [19] and noble metals serve as "catalysts" and also decreases the sensor operation temperature [20]. Platinum (Pt) and Palladium (Pd) are the most used dopants due to their chemical inertness and high work function (~5.8 and ~5.4 eV, respectively) than the band gap (3.6 eV) of SnO2 [21][22][23][24][25]. In other hand, Copper (Cu) is the most used transition metal for doping due its comparable ionic radius as tin.…”
Section: Introductionmentioning
confidence: 99%
“…It confers a naturally n-type conduction to this wide bandgap (about 3.6 eV 5,6 ) semiconductor. Several techniques have been used for the deposition of tin dioxide thin films: sputtering 7 , pyrolysis 8 , sol-gel-dip-coating (SGDC) 9 . Each of these techniques provides films with distinct properties.…”
Section: Introductionmentioning
confidence: 99%