2010 14th International Workshop on Computational Electronics 2010
DOI: 10.1109/iwce.2010.5677950
|View full text |Cite
|
Sign up to set email alerts
|

Small signal analysis of electrically-stressed oxides with Poisson-Schroedinger based multiphonon capture model

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
5
0

Year Published

2011
2011
2017
2017

Publication Types

Select...
4
2

Relationship

3
3

Authors

Journals

citations
Cited by 6 publications
(5 citation statements)
references
References 9 publications
0
5
0
Order By: Relevance
“…2. Furthermore, the proposed model is calculated much more effectively than the model in [9], since it does not need to solve the Possion-Schroedinger equations.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…2. Furthermore, the proposed model is calculated much more effectively than the model in [9], since it does not need to solve the Possion-Schroedinger equations.…”
Section: Resultsmentioning
confidence: 99%
“…In recent years, there are many researches on the T-D model, but most of them are based on the statistical empirical equations [2,3,8], thus cannot give the filling state of bulk traps. D. Garetto et al proposed a T-D model based on multi-phonon trap-assistedtunneling (TAT) mechanism [9], but its calculation is too complicated since it needs to solve the Possion-Schroedinger equations. Besides, it does not include the detrapping way of thermal emission.…”
Section: Introductionmentioning
confidence: 99%
“…The equation has been solved in steady-state conditions (@q T /@t = 0) for DC analysis, and in the Fourier domain for AC analysis following the small-signal model in [17]. The dynamics of multiphonon trapping and tunneling mechanisms are included in the e À C/E frequencies s À1…”
Section: Model Description and Validationmentioning
confidence: 99%
“…Recently, a number of publications [5], [6], [7], [8], [9], [10], [11] reexamined the importance of the multi-phonon-emission assisted structural trap relaxation in the capture and emission dynamics of the dielectric traps. In the frame of a non-elastic process description, the electron capture/emission by a bulk oxide trap involves tunneling of charge carriers from the substrate to the trap and its localization at the trap site accompanied by a distortion of the surrounding lattice.…”
Section: Theory: Mre-assisted Trappingmentioning
confidence: 99%