2012
DOI: 10.1016/j.sse.2011.10.024
|View full text |Cite
|
Sign up to set email alerts
|

Analysis of defect capture cross sections using non-radiative multiphonon-assisted trapping model

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
12
0

Year Published

2013
2013
2021
2021

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 14 publications
(12 citation statements)
references
References 33 publications
0
12
0
Order By: Relevance
“…It is believed that the observed increase in surface capacitance is a result of an increase in surface charge carriers (electrons or holes) in the unoccupied surface states of the BFO nanowire by multiphonon process and has been reported previously for metaloxide-semiconductor (MOS) thin films. 23,24 A systematic recording of the variations in dissipation as a function of incident IR wavelengths gives the spectrum of the adsorbed species, bringing selectivity. Experimentally observed spectrum of RDX molecules adsorbed on nanowire is presented in Figure 5a.…”
mentioning
confidence: 99%
“…It is believed that the observed increase in surface capacitance is a result of an increase in surface charge carriers (electrons or holes) in the unoccupied surface states of the BFO nanowire by multiphonon process and has been reported previously for metaloxide-semiconductor (MOS) thin films. 23,24 A systematic recording of the variations in dissipation as a function of incident IR wavelengths gives the spectrum of the adsorbed species, bringing selectivity. Experimentally observed spectrum of RDX molecules adsorbed on nanowire is presented in Figure 5a.…”
mentioning
confidence: 99%
“…For the calculation of the interface state density we used the difference of the displacement current between uncycled and cycled capacitance and integrated over the positive values. From the simulation of the trapping rate and a gate voltage ramp in the kHz regime we can conclude that only states at the Si/SiO 2 interface are filled [9]. However the write disturb transients show that trapping does not saturate for long disturb times, which points to the conclusion that the whole tunnel oxide is degraded during the endurance cycling.…”
Section: Device Degradation and Test Circuitmentioning
confidence: 91%
“…6. By including the multi-phonon emission at room temperature (Huang et al, 2005b;Ridley, 1978), in this case the capture rate is calculated as (Jim´enez-Molinos et al, 2001;Garetto et al, 2012): …”
Section: Non-radiative Recombination With Defectsmentioning
confidence: 99%