The electrical conductivity and thermopower of Cr,Si,_, thin films with 0.1 < x 10.3 have been investigated between 200 K and 800 K in dependence on annealing up to 950°C. The crystallization of the amorphous as-deposited films takes place in two stages. In the first stage CrSi, is formed, and in the second one Si, resulting in a two-component nanodisperse structure. The transport behaviour clearly reflects these crystallization stages and is discussed by percolation theory. For high T,,, the conductivity shows a percolation threshold at x = 0.12. The thermopower increases with T,,, in both crystallization stages. In the two-component films the themoelectric figure of merit is larger by a factor between 1.5 and 2 in comparison with single-phase CrSi, films.