2006
DOI: 10.1016/j.tsf.2005.10.061
|View full text |Cite
|
Sign up to set email alerts
|

SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

4
48
0

Year Published

2007
2007
2019
2019

Publication Types

Select...
9

Relationship

2
7

Authors

Journals

citations
Cited by 70 publications
(52 citation statements)
references
References 36 publications
4
48
0
Order By: Relevance
“…The choice of these precursors for this study is justified by the fact that ZTB and TrEOS are extensively used in the literature to grow pure silicon oxide, zirconium oxide and zirconium silicates due to their high vapour pressure and general low temperature for synthesis of the mentioned oxides [9,[13][14][15]. The precursors were dosed into the reactor (base pressure ∼ 1 × 10 − 4 Pa) using leak valves with partial pressures in the range between 5 × 10 − 4 and 2 × 10 − 3 Pa. A broad beam ion source (HFQ 1303-3), excited by a RF discharge of Ar/O 2 mixtures (80% Ar and 20% O 2 regarding relative partial pressures) at about 1 × 10 − 1 Pa, was used to supply bombarding ions with 400 eV.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The choice of these precursors for this study is justified by the fact that ZTB and TrEOS are extensively used in the literature to grow pure silicon oxide, zirconium oxide and zirconium silicates due to their high vapour pressure and general low temperature for synthesis of the mentioned oxides [9,[13][14][15]. The precursors were dosed into the reactor (base pressure ∼ 1 × 10 − 4 Pa) using leak valves with partial pressures in the range between 5 × 10 − 4 and 2 × 10 − 3 Pa. A broad beam ion source (HFQ 1303-3), excited by a RF discharge of Ar/O 2 mixtures (80% Ar and 20% O 2 regarding relative partial pressures) at about 1 × 10 − 1 Pa, was used to supply bombarding ions with 400 eV.…”
Section: Methodsmentioning
confidence: 99%
“…It is known that the use of ion beams to assist the deposition of this kind of films leads to the formation of compact and smooth thin films [5]. This method has been previously used to produce the single SiO 2 [10,11] and ZrO 2 [12] oxides and other mixed oxide as titanium aluminates [7,8] or titanium silicates [9].…”
Section: Introductionmentioning
confidence: 99%
“…Sol-Gel process [6][7][8] and plasmaenhanced chemical vapour deposition (PE-CVD) [9]. The Sol-Gel process is a wet chemical process and the PE-CVD is commonly performed under vacuum.…”
Section: Introductionmentioning
confidence: 99%
“…Metal oxide nanoparticles may potentially be inexpensive alternatives to carbon nanotubes with superior properties for many applications including catalysis, separation, gas storage, energy conversion, drug release, sensing and environmental protection, and biocompatible nanocomposites. The modified form of TiO 2 composites such as TiO 2 -SiO 2 , TiO 2 /SiO 2 are interest for their potential application, such as electrolytes in dye-sensitized solar cells, anti reflection coating, photocatalysts and so on [1][2][3][4][5][6][7].…”
Section: Introductionmentioning
confidence: 99%